Browsing by Author "Dauendorffer, Arnaud"
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Publication Approaches to Enable Patterning of Tight Pitches towards High NA EUV
;Tadatomo, Hiroki ;Dauendorffer, Arnaud ;Onitsuka, Tomoya ;Genjima, HisashiIdo, YasuyukiProceedings paper2022, Conference on Advanced Etch Technology and Process Integration for Nanopatterning XI Part of SPIE Advanced Lithography and Patterning Conference, APR 24-MAY 27, 2020-2022, p.120560FPublication Elucidating the role of imaging metrics for variability and after etch defectivity
Journal article2022, JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3, (21) 2, p.Art. 023201Publication EUV Metal Oxide Resist Development Technology for Improved Sensitivity, Roughness and Pattern Collapse Margin for High Volume Manufacturing
;Dinh, Cong Que ;Nagahara, Seiji ;Kuwahara, Yuhei ;Dauendorffer, ArnaudYoshida, KeisukeJournal article2022, JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, (35) 1, p.87-93Publication Novel processing technologies for advanced EUV patterning materials using metal oxide resist (MOR)
;Onitsuka, Tomoya ;Kawakami, Shinichiro ;Dauendorffer, ArnaudShimura, SatoruProceedings paper2021, Conference on Extreme Ultraviolet (EUV) Lithography XII, FEB 22-26, 2021, p.116091LPublication Recent advances in EUV patterning in preparation towards high-NA EUV
Proceedings paper2023, Conference on Advances in Patterning Materials and Processes XL, FEB 27-MAR 01, 2023, p.Art. 124981G