Browsing by Author "Foubert, Philippe"
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Publication 28nm pitch single exposure patterning readiness by metal oxide resist on 0.33NA EUV Lithography
Publication A CDU comparison of double-patterning process options using Monte Carlo simulation
Proceedings paper2009, Optical Microlithography XXII, 22/02/2009, p.72741UPublication Analysis of the effect of point-of-use filtration on microbridging defectivity
Proceedings paper2009, Advances in Resist Materials and Processing Technology XXVI, 22/02/2009, p.72730SPublication Approaches to Enable Patterning of Tight Pitches towards High NA EUV
Publication Assessment of EUV resist performance for sub-22nm hp lines and 26nm hp contacts on NXE3100
Oral presentation2012, International Symposium on Extreme Ultraviolet Lithography - EUVLPublication BARC process optimatization for hyper NA tools and influence of polarization on CD swing and standing waves
Oral presentation2005, 2nd International Symposium on Immersion LithographyPublication Calibrated PSCAR stochastic simulation
Publication Continued Optimization of Point-Of-Use Filtration for Metal Oxide Photoresists to Reduce Defect Density
Proceedings paper2023, Conference on Advances in Patterning Materials and Processes XL, FEB 27-MAR 01, 2023, p.Art. 124980APublication Continuous improvements of defectivity rates in immersion photolithography via functionalized membranes in point-of-use photochemical filtration
Proceedings paper2017, Advances in Patterning Materials and Processes XXXIV, 26/02/2017, p.101462APublication Current and future requirements for metrology and inspection for advanced patterning
Proceedings paper2016, 29th International Microprocesses and Nanotechnology Conference - IMNC, 8/11/2016Publication Defectivity modulation in EUV resists through advanced filtration technologies
Proceedings paper2020, Advances in Patterning Materials and Processes XXXVII, 23/02/2020, p.113260KPublication Defectivity reduction in EUV resists through novel high-performance Point-Of-Use (POU) filters
Publication Defectivity study on dry development rinse process (DDRP)
; ; ; ; Publication Effect of water on resist performance beyond resolution enhancement in 193nm immersion lithography
Proceedings paper2005, 2nd International Symposium on Immersion Lithography, 12/09/2005Publication EUV baseline process optimizations for NXE:3100 evaluation
Proceedings paper2011, International Symposium on Extreme Ultraviolet Lithography - EUVL, 17/10/2011Publication EUV lithographic process enablement with novel litho track hardware
Proceedings paper2021, Conference on Advances in Patterning Materials and Processes XXXVIII Part of SPIE Advanced Lithography Conference, FEB 22-26, 2021, p.116120MPublication EUV Lithography in pre-production mode
Oral presentation2012, 56th International Conference on Electron, Ion, Photon Beam Technology and Nanofabrication - EIPBNPublication EUV Metal Oxide Resist Development Technology for Improved Sensitivity, Roughness and Pattern Collapse Margin for High Volume Manufacturing
Publication EUV patterning improvement toward high-volume manufacturing
Meeting abstract2015, Extreme Ultraviolet (EUV) Lithography VI, 22/02/2015, p.94221X