Browsing by Author "Fyen, Wim"
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Publication A computational approach to predict the motion of magnetic particles manipulated by on-chip generated magnetic forces
Oral presentation2005, MMM ConferencePublication A detailed study of semiconductor wafer drying
Oral presentation2004, Particles on Surfaces 8Publication A force study in brush scrubbing
Proceedings paper2005, Ultra Clean Processing of Silicon Surfaces VII: Proceedings of the 7th International Symposium, 20/09/2004, p.279-282Publication A force study of on-chip magnetic particle transport based on tapered conductors
Journal article2005, IEEE Trans. Magnetics, 41, p.4128-4133Publication A fundamental study of the rinsing and drying step in semiconductor wet cleaning
Fyen, WimPHD thesis2003-05Publication A high-performance drying method enabling clustered single wafer wet cleaning
Proceedings paper2000, Symposium on VLSI Technology. Digest of Technical Papers, 13/06/2000, p.56-57Publication Advanced wafer surface cleaning technology
Oral presentation2004, SEMICON Korea 2004 STS, S5: Contamination-free Manufacturing SeminarPublication An analytical model to describe the efficiency of an immersion rinsing process
Publication Cleaning of metal gate stacks for the sub 90nm technology node
Meeting abstract2003, 204th Meeting of the Electrochemical Society: 8th Int. Symp. on CLeaning Technology in Semiconductor Device Manufacturing, 12/10/2003Publication Cleaning of metal gate stacks for the sub 90nm technology node
Proceedings paper2004, Cleaning Technology in Semiconductor Device Manufacturing VIII. Proceedings of the International Symposium, 12/10/2003, p.393-399Publication Cleaning of nanoparticles in semiconductor manufacturing
Oral presentation2004, BePCIS Seminar on Selected Topics in NanotechnologyPublication Cleaning, rinsing and drying aspects in post-Cu-CMP clean
Oral presentation1999, 4th International Symposium on Chemical-Mechanical Polishing; 8-11 August 1999; Lake Placid, NY, USA.Publication Cleaning, rinsing and drying effects in post-Cu CMP clean
; ; ; Proceedings paper2000, Proceedings CMP for ULSI Multilevel Interconnection Conference (CMP-MIC); 2-3 March 2000; Santa Clara, Ca, USA., p.507Publication Cleaning, rinsing and drying issues in post-Cu CMP cleaning: a case study
Proceedings paper2002, Particles on Surfaces 7: Detection, Adhesion and Removal, 19/06/2000, p.69-95Publication Clustered single wafer wet cleaning
; ; ; ; Publication Correlation between haze of the wafer and particle-count on wafers: a new approach to monitor nano-sized particles
Oral presentation2002, UCPSS - Ultra Clean Processing Technology SymposiumPublication Critical issues in post Cu CMP cleaning
Proceedings paper2000, Proceedings of the 9th International Symposium on Semiconductor Manufacturing - ISSM, 26/09/2000, p.415-418Publication Critical issues in the integration of Copper and low-k dielectrics
Proceedings paper1999, Proceedings of the International Interconnect Technology Conference - IITC; San Francisco, CA, USA., p.262-264Publication Damage-free removal of nano-sized particles, heading towards a red brick wall
Oral presentation2003, International Sematech Wafer Cleaning and Surface Preparation WorkshopPublication Developments in cleaning technology for critical layers
Oral presentation2000, Santa Clara Plastics Symposium on Cleaning Technology; May 2000