Browsing by Author "Hatcher, Z."
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Publication Advanced single chemistry alkaline cleaning in a STEAG single tank tool
Meeting abstract2001, 200th Meeting of the Electrochemical Society: 7th International Symposium on Cleaning Technology in Semiconductor Device Manufac, 2/09/2001Publication Advanced single chemistry alkaline cleaning in a STEAG single tank tool
Proceedings paper2002, Cleaning Technology in Semiconductor Device Manufacturing VII, 4/09/2001, p.23-30Publication Cleaning technology for highly reliable gate oxides
Proceedings paper1994, Proceedings of the International Conference on Advanced Microelectronic Devices and Processing - AMDP, 03/03/1994, p.59-66Publication Corrosion of aluminum alloys during drying of metallized wafers
Proceedings paper1998, Proceedings of the 5th International Symposium on Cleaning Technology in Semiconductor Device Manufacturing, 31/08/1997, p.569-578Publication H2O2 decomposition and its impact on silicon surface roughening and gate oxide integrity
Journal article1995, Japanese Journal of Applied Physics. Part 1, (34) 2B, p.727-731Publication Improved phosphoric acid mixtures for nitride strip
; ; ; ; ; Hatcher, Z.Proceedings paper2001, Ultra Clean Processing of Silicon Surfaces 2000: Proceedings of the 5th International Conference - UCPSS, 18/09/2000, p.43-46Publication Just-Clean- Enough technology for the 21st century
Oral presentation1995, SEMICON EuropePublication Physico chemical aspects of hydrogen peroxide based silicon wafer cleaning solutions
Proceedings paper1994, Proceedings of the 2nd International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS, 19/09/1994, p.259-266Publication Quantitative modeling of H2O2 decomposition in SC1
Proceedings paper1998, Proceedings of the 5th International Symposium on Cleaning Technology in Semiconductor Device Manufacturing, 31/08/1997, p.176-183Publication Removal of submicrometer particles from silicon wafer surfaces using HF-based cleaning mixtures
Journal article2001, Journal of the Electrochemical Society, (148) 12, p.G683-G691Publication Single chemistry cleaning solution for advanced wafer cleaning
Proceedings paper2001, Ultra Clean Processing of Silicon Surfaces 2000: Proceedings of the 5th International Conference - UCPSS, 18/09/2000, p.119-122Publication The importance of H2O2 decomposition in silicon surface cleaning
Proceedings paper1994, Extended Abstracts of the International Conference on Solid State Devices and Materials - SSDM, 23/08/1994, p.419-421Publication Ultra Clean Processing Technologies: Advanced Si-Surface Preparation Techniques
Proceedings paper1994, Isolators and Minienvironments. Scottish Society for Contamination Control; November 9, 1994; Glasgow, UK., p.38-48Publication Ultra clean processing technologies: advanced si-surface preparation techniques
Proceedings paper1994, Technical Conference SEMICON / Europe, 12/04/1994Publication Ultra clean processing technology for highly reliable gate oxides
Proceedings paper1994, Proceedings of the Institute of Environmental Science: 40th Annual Technical Meeting, 01/05/1994, p.200-209Publication Use of surfactants for improved particle performance of dHF-based cleaning recipes
; ; ; Hatcher, Z.Proceedings paper2001, Ultra Clean Processing of Silicon Surfaces 2000: Proceedings of the 5th International Conference - UCPSS, 18/09/2000, p.263-266