Browsing by Author "Hepp, Birgitt"
Now showing 1 - 5 of 5
- Results per page
- Sort Options
Publication Critical assessment of error budget components in double patterning immersion lithography
Proceedings paper2008, 5th International Symposium on Immersion Lithography Extensions, 22/09/2008Publication Dense lines created by spacer DPT scheme: process control by local dose adjustment using advanced scanner control
Proceedings paper2009, Optical Microlithography XXII, 23/02/2009, p.72740RPublication Double patterning for 32-nm and below: an update
Proceedings paper2008, Optical Microlithography XXI, 24/02/2008, p.692408Publication Double patterning lithography for 32 nm: critical dimensions uniformity and overlay control considerations
Journal article2009, J. Micro/Nanolithography, MEMS, and MOEMS, (8) 1, p.11002Publication Spacer self aligned double patterning: process control
Oral presentation2009, 10th ASML Technology Conference