Browsing by Author "Heyne, Markus"
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Publication A route towards the fabrication of 2D heterostructures using atomic layer etching combined with selective conversion
;Heyne, Markus ;Marinov, Daniil ;Braithwaite, NicholasGoodyear, AndyJournal article2019, 2D Materials, (6) 3, p.35030Publication An experimental study of VUV plasma damage on porous organo-silicon glass materials
Meeting abstract2013-02, SPIE Advanced Lithography Conference: Advanced Etch Technology for Nanopatterning II, 24/02/2013Publication Atomic layer deposition of 2D transition metal dichalogenides
Proceedings paper2015-10, International Workshop 'Atomic Layer Deposition: Russia 2015', 21/09/2015, p.16-17Publication Atomic layer etching of amorphous Si on MoS2 for selectively patterned MX2 heterostructures
Proceedings paper2017, iPlasmaNano-VIII, 2/07/2017Publication Atomic layer etching of amorphous silicon with selectivity towards MoS2
Meeting abstract2017, International Atomic Layer Etching Workshop - ALE, 15/07/2017Publication Atomic layer etching of amorphous silicon with selectivity towards MoS2 for novel MX2 heterostructure device concepts
Proceedings paper2017, 10th Plasma Etch and Strip for Microtechnology Workshop - PESM, 19/10/2017Publication Atomic layer processing of 2D materials for beyond CMOS applications
Meeting abstract2016, International Conference on Atomic Layer Deposition - ALD, 24/07/2016Publication BEOL compatible WS2 transistors fully fabricated in a 300 mm pilot line
Proceedings paper2017, Silicon Nanoelectronics Workshop - SNW, 4/07/2017, p.139-140Publication Challenges and opportunities for Atomic Layer Deposition of 2D transition metal dichalcogenides
Oral presentation2016, Workshop on Atomic Layer Deposition for 2D MaterialsPublication Characterization of grain boundaries and impact of plasma-induced patterned in 2D materials
Oral presentation2017, Material Reserach Society Spring MeetingPublication Chemistry and plasma physics challenges for 2D materials technology
Heyne, MarkusPHD thesis2019-09Publication Comparative study of the growth behaviour of 2D WS2 by Atomic Layer Deposition (ALD) and Chemical Vapor Deposition (CVD), and the impact on the 2D crystal structure
Proceedings paper2016, 16th International Conference on Atomic Layer Deposition, 24/07/2016Publication Controlled sulfurization process for the synthesis of large area MoS2 films and MoS2-WS2 heterostructures
Journal article2016, Advanced Materials Interfaces, (3) 4, p.DOI: 10.1002/adPublication Cryogenic etching vs P4 approaches: paths towards ultra-low damage integration of mesoporous oxide dielectric materials
Meeting abstract2014, AVS 61st International Symposium and Exhibition, 9/11/2014, p.EM-TuM-6Publication Effect of 147 nm radiation on a 2.0 porous organo-Silicon glass
Meeting abstract2013, Materials for Advanced Metallization - MAM, 11/03/2013, p.119-120Publication Effect of 147nm photons on porous Organo-Silicon Glass materials and damage improvement by optimized Cu/low-k integration approaches
Meeting abstract2014, AVS 61st International Symposium and Exhibition, 9/11/2014, p.PS-MoM4Publication Growth of multilayer transition-metal dichalcogenide layers by high temperature sulfurization in H2S
Oral presentation2015, Nanospectroscopy for Two-dimensional MaterialsPublication Highly efficient and stable MoS2 FETs with reversible n-doping using a dehydrated poly(vynyl-alcohol) coating
Journal article2017, Nanoscale, (9) 1, p.258-265Publication Improved plasma resistance for porous low-k dielectrics by pore stuffing approach
Journal article2015, ECS Journal of Solid State Science and Technology, (4) 1, p.N3098-N3107Publication Insight in nucleation mechanisms of semiconducting 2D metal sulfides and application to area selective deposition
Meeting abstract2017, 2nd Area Selective Deposition Workshop - ASD, 20/04/2017
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