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Browsing by Author "Heyne, Markus"

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    A route towards the fabrication of 2D heterostructures using atomic layer etching combined with selective conversion

    Heyne, Markus
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    Marinov, Daniil
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    Braithwaite, Nicholas
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    Goodyear, Andy
    Journal article
    2019, 2D Materials, (6) 3, p.35030
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    An experimental study of VUV plasma damage on porous organo-silicon glass materials

    de Marneffe, Jean-Francois  
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    Lukaszewicz, Mikolaj
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    Heyne, Markus
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    Zhang, Liping  
    Meeting abstract
    2013-02, SPIE Advanced Lithography Conference: Advanced Etch Technology for Nanopatterning II, 24/02/2013
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    Atomic layer deposition of 2D transition metal dichalogenides

    Delabie, Annelies  
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    Caymax, Matty  
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    Groven, Benjamin  
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    Heyne, Markus
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    Haesevoets, Karel  
    Proceedings paper
    2015-10, International Workshop 'Atomic Layer Deposition: Russia 2015', 21/09/2015, p.16-17
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    Atomic layer etching of amorphous Si on MoS2 for selectively patterned MX2 heterostructures

    Heyne, Markus
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    Goodyear, Andy
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    de Marneffe, Jean-Francois  
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    Cooke, Mike
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    Neyts, Erik
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    Radu, Iuliana  
    Proceedings paper
    2017, iPlasmaNano-VIII, 2/07/2017
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    Atomic layer etching of amorphous silicon with selectivity towards MoS2

    Heyne, Markus
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    Goodyear, Andy
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    de Marneffe, Jean-Francois  
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    Cooke, Mike
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    Radu, Iuliana  
    Meeting abstract
    2017, International Atomic Layer Etching Workshop - ALE, 15/07/2017
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    Atomic layer etching of amorphous silicon with selectivity towards MoS2 for novel MX2 heterostructure device concepts

    Heyne, Markus
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    Goodyear, Andy
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    de Marneffe, Jean-Francois  
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    Cooke, Mike
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    Neyts, Erik C.
    Proceedings paper
    2017, 10th Plasma Etch and Strip for Microtechnology Workshop - PESM, 19/10/2017
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    Atomic layer processing of 2D materials for beyond CMOS applications

    Delabie, Annelies  
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    Caymax, Matty  
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    Groven, Benjamin  
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    Heyne, Markus
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    Zhang, Haodong
    Meeting abstract
    2016, International Conference on Atomic Layer Deposition - ALD, 24/07/2016
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    BEOL compatible WS2 transistors fully fabricated in a 300 mm pilot line

    Schram, Tom  
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    Smets, Quentin  
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    Heyne, Markus
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    Groven, Benjamin  
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    Kunnen, Eddy
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    Thiam, Arame  
    Proceedings paper
    2017, Silicon Nanoelectronics Workshop - SNW, 4/07/2017, p.139-140
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    Challenges and opportunities for Atomic Layer Deposition of 2D transition metal dichalcogenides

    Delabie, Annelies  
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    Groven, Benjamin  
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    Heyne, Markus
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    Zhang, Haodong
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    Tomczak, Yoann  
    Oral presentation
    2016, Workshop on Atomic Layer Deposition for 2D Materials
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    Characterization of grain boundaries and impact of plasma-induced patterned in 2D materials

    Celano, Umberto  
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    Virkki, Olli
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    Chiappe, Daniele
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    Heyne, Markus
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    Hoflijk, Ilse  
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    Franquet, Alexis  
    Oral presentation
    2017, Material Reserach Society Spring Meeting
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    Chemistry and plasma physics challenges for 2D materials technology

    Heyne, Markus
    PHD thesis
    2019-09
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    Comparative study of the growth behaviour of 2D WS2 by Atomic Layer Deposition (ALD) and Chemical Vapor Deposition (CVD), and the impact on the 2D crystal structure

    Groven, Benjamin  
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    Claes, Dieter  
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    Heyne, Markus
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    Meersschaut, Johan  
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    Nuytten, Thomas  
    Proceedings paper
    2016, 16th International Conference on Atomic Layer Deposition, 24/07/2016
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    Controlled sulfurization process for the synthesis of large area MoS2 films and MoS2-WS2 heterostructures

    Chiappe, Daniele
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    Asselberghs, Inge  
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    Sutar, Surajit  
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    Iacovo, Serena  
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    Afanasiev, Valeri  
    Journal article
    2016, Advanced Materials Interfaces, (3) 4, p.DOI: 10.1002/ad
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    Cryogenic etching vs P4 approaches: paths towards ultra-low damage integration of mesoporous oxide dielectric materials

    de Marneffe, Jean-Francois  
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    Zhang, Liping  
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    Heyne, Markus
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    Krishtab, Mikhail  
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    Goodyear, Andy
    Meeting abstract
    2014, AVS 61st International Symposium and Exhibition, 9/11/2014, p.EM-TuM-6
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    Effect of 147 nm radiation on a 2.0 porous organo-Silicon glass

    de Marneffe, Jean-Francois  
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    Lukaszewicz, Mikolaj
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    Porter, Stephen
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    Zhang, Liping  
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    Heyne, Markus
    Meeting abstract
    2013, Materials for Advanced Metallization - MAM, 11/03/2013, p.119-120
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    Effect of 147nm photons on porous Organo-Silicon Glass materials and damage improvement by optimized Cu/low-k integration approaches

    Zhang, Liping  
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    de Marneffe, Jean-Francois  
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    Lukaszewicz, Mikolaj
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    Barry-Porter, Stephen
    Meeting abstract
    2014, AVS 61st International Symposium and Exhibition, 9/11/2014, p.PS-MoM4
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    Growth of multilayer transition-metal dichalcogenide layers by high temperature sulfurization in H2S

    Heyne, Markus
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    Nuytten, Thomas  
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    Meersschaut, Johan  
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    Chiappe, Daniele
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    Caymax, Matty  
    Oral presentation
    2015, Nanospectroscopy for Two-dimensional Materials
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    Highly efficient and stable MoS2 FETs with reversible n-doping using a dehydrated poly(vynyl-alcohol) coating

    Lockhart de la Rosa, Cesar Javier  
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    Nourbakhsh, Amirhasan
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    Heyne, Markus
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    Asselberghs, Inge  
    Journal article
    2017, Nanoscale, (9) 1, p.258-265
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    Improved plasma resistance for porous low-k dielectrics by pore stuffing approach

    Zhang, Liping  
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    de Marneffe, Jean-Francois  
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    Heyne, Markus
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    Naumov, Sergej
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    Sun, Yiting  
    Journal article
    2015, ECS Journal of Solid State Science and Technology, (4) 1, p.N3098-N3107
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    Insight in nucleation mechanisms of semiconducting 2D metal sulfides and application to area selective deposition

    Delabie, Annelies  
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    Tomczak, Yoann  
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    Heyne, Markus
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    Groven, Benjamin  
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    van Pelt, Thomas  
    Meeting abstract
    2017, 2nd Area Selective Deposition Workshop - ASD, 20/04/2017
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