Browsing by Author "Hsu, Stephen"
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Publication Assist features: placement, impact and relevance
Proceedings paper2016, Extreme Ultraviolet (EUV) Lithography VII, 21/02/2016, p.97761SPublication Double dipole lithography for 65-nm node and beyond: a technology readiness review
Proceedings paper2004-08, Photomask and Next-Generation Lithography Mask Technology XI, 14/04/2004, p.481-498Publication Experimental verification of source-mask optimization and freeform illumination for 22 nm node SRAM cells
Journal article2011-03, Journal of Micro/Nanolithography MEMS and MOEMS, (10) 1, p.13008Publication Freeform illumination sources: Source mask optimization for 22 nm node SRAM
Proceedings paper2009, 6th International Symposium on Immersion Lithography Extensions, 22/10/2009Publication OPC resist model separability validation after SMO source change
Proceedings paper2013, Optical Microlithography XXVI, 24/02/2013, p.86831BPublication Through pitch low-k1 contact hole imaging with CPL(TM) technology
Journal article2004, Photomask, BACUS News, (20) 12, p.1-11Publication Through pitch low-k1 contact hole imaging with CPLTM technology
Proceedings paper2004, Photomask and Next-Generation Lithography Mask Technology XI, 14/04/2004, p.585-594