Browsing by Author "Ishimoto, Toru"
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Publication A practical application of multiple parameters profile characterization (MPPC) using CD-SEM on production wafers using Hyper-NA lithography
Proceedings paper2009, Metrology, Inspection and Process Control for Microlithography XXIII, 22/02/2009, p.72722EPublication Advanced CD-SEM metrology to improve total process control performance for hyper-NA lithography
Publication Advanced process control for hyper-NA lithography based on CD-SEM measurement
Proceedings paper2007, Metrology, Inspection and Process Control for Microlithography XXI, 25/02/2007, p.65182PPublication Application of model-based library approach to photoresist pattern shape measurement in advenced lithography
Publication Calibration studies of pattern top resist loss detection by CD-SEM for advanced lithography process
Publication Contour-based metrology for complex 2D shaped patterns printed by multiple-patterning process
Publication Enabling CD SEM metrology for 5nm technology node and beyond
Proceedings paper2017, Metrology, Inspection, and Process Control for Microlithography XXXI, 26/02/2017, p.1014512Publication Evaluation of roughness transfer from Litho to Etch using CD-SEM
Publication Further study on the verification of CD-SEM based monitoring for hyper NA lithography
Proceedings paper2008, Metrology, Inspection, and Process Control for Microlithography XXII, 24/02/2008, p.69222OPublication Impact of annealing temperature on DSA process: toward faster assembly kinetics
Proceedings paper2018, Advances in Patterning Materials and Processes XXXV, 24/02/2018, p.105860TPublication LCDU and placement improvement of contacts using EUV templated DSA
Oral presentation2018, SPIE 2018Publication Need for LWR metrology standardization: the imec roughness protocol
Journal article2018, Journal of Micro/Nanolithography MEMS and MOEMS, 17, p.41009Publication Resist roughness evaluation and frequency analysis: metrological challenges and potential solutions for EUV lithography
Journal article2010, Journal of Micro/Nanolithography MEMS and MOEMS, (9) 4, p.41308Publication Study on practical application of pattern top resist loss measurement by CD-SEM for high NA immersion lithography
Publication The need for LWR metrology standardization: the imec roughness protocol
Proceedings paper2018, Metrology, Inspection, and Process Control for Microlithography XXXII, 25/02/2018, p.105850D