Browsing by Author "Kenens, Conny"
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Publication A controlled deposition of organic contamination and the removal with ozone based cleaning
Proceedings paper2001, Ultra Clean Processing of Silicon Surfaces 2000: Proceedings of the 5th International Conference - UCPSS, 18/09/2000, p.223-226Publication Combining TOF-SIMS with XPS to quantify organic surface coverages
Proceedings paper2000, Secondary Ion Mass Spectrometry - SIMS XII. Proceedings of the 12th International Conference, 5/09/1999, p.821-824Publication Combining TOFSIMS with XPS and AFM to quantify organic surface coverages
Oral presentation2000, Quantitative Surface Analysis-11; 3-7 July 2000; Surrey, UK.Publication Controlled deposition of organic contamination and removal with ozone-based cleaning
Journal article2001, Journal of the Electrochemical Society, (148) 3, p.G118-125Publication Cost-effective cleaning and high-quality thin gate oxides
Journal article1999, IBM Journal of Research and Development, (43) 3, p.339-350Publication Efficiency of ozonated DI water in removing organic contamination
Proceedings paper1998, Proceedings of the 5th International Symposium on Cleaning Technology in Semiconductor Device Manufacturing, 31/08/1997, p.247-255Publication Organic contamination in the integrated circuit processing: controlled by and for time-of-flight secondary ion mass spectrocopy.
Kenens, ConnyPHD thesis2000Publication Removal of organic contamination from silicon surfaces
Proceedings paper1996, Proceedings of the 3rd International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS, 23/09/1996, p.107-110Publication Removal of submicrometer particles from silicon wafer surfaces using HF-based cleaning mixtures
Journal article2001, Journal of the Electrochemical Society, (148) 12, p.G683-G691Publication TOFSIMS and XPS characterization of stearic acid Langmuir-Blodgett films
Oral presentation1997, SIMS XI; 8-12 September 1997; Orlando, Fl., USA.Publication TOFSIMS evaluation of the removal of resists on silicon by ozone-based cleaning
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