Browsing by Author "Knotter, Martin"
Now showing 1 - 8 of 8
- Results per page
- Sort Options
Publication A novel resist and post-etch residue removal process using ozonated chemistry
Oral presentation1998, 4th International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSSPublication Behaviour of metallic contaminants during MOS processing
Oral presentation1998, 4th International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSSPublication Behaviour of metallic contaminants during MOS processing
Proceedings paper1999, Ultra Clean Processing of Silicon Surfaces; Proceedings of the 4th International Symposium on Ultra Clean Processing of Silicon, 21/09/1998, p.11-14Publication Deposition of particles on patterned silicon wafers
Oral presentation2008, 9th International Symposium on Ultra Clean Processing of Semiconductor Surfaces - UCPSSPublication Impact of organic contamination on gate oxide integrity
Proceedings paper1998, 44th Annual Meeting of Inst. Environmental Science and Technology, 26/04/1998, p.87-93Publication Quantitative modeling of H2O2 decomposition in SC1
Proceedings paper1998, Proceedings of the 5th International Symposium on Cleaning Technology in Semiconductor Device Manufacturing, 31/08/1997, p.176-183Publication Ultra thin gate oxide technology and reliability
Proceedings paper1996, Proceedings 5th International Symposium on Semiconductor Manufacturing - ISSM, 2/10/1996, p.208-211Publication Use of grazing emission XRF for silicon wafer surface contamination measurements
Proceedings paper1996, Proceedings of the 3rd International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS, 23/09/1996, p.57-60