Browsing by Author "Kondoh, Eiichi"

Proceedings paper

1998, Proceedings of the 5th International Symposium on Cleaning Technology in Semiconductor Device Manufacturing, 31/08/1997, p.602-609

Publication

Applications of in-line oxygen monitoring to a rapid thermal processing tool: diagnosing gas flow dynamics and silicidation processes

Kondoh, Eiichi

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Baklanov, Mikhaïl

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Journal article

2000, Materials Science in Semiconductor Processing, (2) 4, p.341-348

Publication

Characterisation of HF-last cleaning of ion-implanted Si surfaces

Kondoh, Eiichi

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Baklanov, Mikhaïl

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Jonckx, Franky

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Journal article

1998, Materials Science in Semiconductor Processing, (1) 2, p.107-117

Publication

Characterization of HF-last cleaning of ion-implanted Si surfaces

Kondoh, Eiichi

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Baklanov, Mikhaïl

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Proceedings paper

1999, Ultra Clean Processing of Silicon Surfaces; Proceedings of the 4th International Symposium on Ultra Clean Processing of Silicon, 21/09/1998, p.271-274

Publication

Characterization of HF-last cleaning of ion-implanted Si surfaces

Kondoh, Eiichi

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Baklanov, Mikhaïl

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Oral presentation

1998, 4th International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS

Publication

Comparative study of pore size of low-dielectric-constant porous spin-on-glass films using different methods of nondestructive instrumentation

Kondoh, Eiichi

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Baklanov, Mikhaïl

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Lin, E.

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Gidley, D.

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Nakashima, A.

Journal article

2001, Japanese Journal of Applied Physics Part 2-Letters, (40) 4A, p.L323-L326

Publication

Comparative study of porous SOG films with different non-destructive instrumentation

Baklanov, Mikhaïl

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Kondoh, Eiichi

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Linskens, Frank

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Gidley, D. W.

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Lee, Hean-Cheal

Proceedings paper

2001, Proceedings of the IEEE 2001 International Interconnect Technology Conference, 4/06/2001, p.189-191

Publication

Control and impact of processing ambient during rapid thermal silicidation

de Potter de ten Broeck, Muriel

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Kondoh, Eiichi

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Lauwers, Anne

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Steegen, An

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Proceedings paper

1998, Rapid and Contact Integrated Processing VII, 13/04/1998, p.297-306

Publication

Critical role of degassing for hot aluminum filling

Proost, Joris

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Kondoh, Eiichi

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Journal article

1998, Journal of Vacuum Science and Technology B, (16) 4, p.2091-2098

Publication

Development of a non-destructive thin film porosimetry: pore size distribution and pore volume of porous silica

Baklanov, Mikhaïl

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Dultsev, F. N.

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Kondoh, Eiichi

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Mogilnikov, K. P.

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Wang, Sharon

Proceedings paper

1999, Advanced Metallization Conference in 1998. Proceedings of the Conference;, p.507-512

Publication

In situ gas analysis on an RTP tool with APIMS

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Kondoh, Eiichi

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Richardson, Paul

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Nényei, Z.

Proceedings paper

1998, 44th Annual Meeting of Inst. Environmental Science and Technology, 26/04/1998, p.519-526

Publication

In-line ambient impurity measurement of a rapid thermal process chamber by using atmospheric pressure ionization mass spectrometer

Kondoh, Eiichi

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Gutt, T.

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Nényei, Z.

Proceedings paper

1998, Rapid Thermal and Integrated Processing VII, 13/04/1998, p.51-56

Publication

In-line monitoring of HF-last cleaning of implanted and non-implanted silicon surfaces by non-contact surface charge measurements

Kondoh, Eiichi

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Trauwaert, Marie-Astrid

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Proceedings paper

1998, Proceedings of the 5th International Symposium on Cleaning Technology in Semiconductor Device Manufacturing, 31/08/1997, p.221-228

Publication

In-situ oxygen monitoring of rapid thermal process chamber: diagnosis of gas flow dynamics and wafer processing

Kondoh, Eiichi

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Proceedings paper

1997, Rapid Thermal and Integrated Processing VI, 1/04/1997, p.245-251

Publication

Interaction between Co and SiO2

Kondoh, Eiichi

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Donaton, R. A.

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Jin, S.

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Bender, Hugo

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Vandervorst, Wilfried

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Journal article

1998, Applied Surface Science, (32) 3_4, p.87-94

Publication

Limitation of HF-based chemistry for deep-submicron contact hole cleaning on silicides

Baklanov, Mikhaïl

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Kondoh, Eiichi

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Alves Donaton, Ricardo

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Vanhaelemeersch, Serge

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Journal article

1998, Journal of the Electrochemical Society, (145) 9, p.3240-3246

Publication

Measurements of trace gaseous ambient impurities on an atmospheric pressure rapid thermal processor

Kondoh, Eiichi

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Gutt, T.

Journal article

1999, J. Vacuum Science and Technology A, (17) 2, p.650-656

Publication

Non-destructive determination of pore size distribution of low-k porous SOG films

Baklanov, Mikhaïl

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Kondoh, Eiichi

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Gidley, D.

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Lin, E.

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Wu, Wen

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Arao, H.

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Mogilnikov, K. P.

Oral presentation

2000, 60th Japan Society of Applied Physics Autumn Meeting; September 2000; Japan.

Publication

Oxidation and roughening of silicon during annealing in a rapid thermal processing chamber

Mohadjeri, Babak

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Baklanov, Mikhaïl

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Kondoh, Eiichi

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