Browsing by Author "Kozawa, Takahiro"
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Publication Extreme Ultraviolet Lithographic Performance and Reaction Mechanism of Polymeric Resist-Utilizing Radical- and Acid-Amplified Cross-Linking
Journal article2024, CHEMISTRY OF MATERIALS, (36) 3, p.1459-1471Publication Reaction Mechanisms and EB Patterning Evaluation of Sn-complex-side-chain Polymer Used for EUV Lithography
Proceedings paper2023, Conference on Advances in Patterning Materials and Processes XL, FEB 27-MAR 01, 2023, p.1249826Publication Reaction mechanisms of Sn-based polarity-change copolymer resists with different counter anions, designed for extreme ultraviolet lithography
Publication Reaction mechanisms of Sn-complex-side-chain polymer used for extreme ultraviolet lithography, studied by electron pulse radiolysis and & gamma;-radiolysis
Journal article2023, JAPANESE JOURNAL OF APPLIED PHYSICS, (62) 7, p.Art. 076502Publication Role of metal sensitizers for sensitivity improvement in EUV chemically amplified resist
Journal article2019, Journal of Photopolymer Science and Technology, (31) 6, p.747-751Publication Sensitizers in EUV chemically amplified resist: mechanism of sensitivity improvement
Proceedings paper2018, Extreme Ultraviolet (EUV) Lithography IX, 25/02/2018, p.1058307Publication Sensitizers in extreme ultraviolet chemically amplified resists: mechanism of sensitivity improvement
Journal article2019, Journal of Micro/Nanolithography MEMS and MOEMS, (17) 4, p.43506