Browsing by Author "Kozawa, Takahiro"
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Publication Extreme Ultraviolet Lithographic Performance and Reaction Mechanism of Polymeric Resist-Utilizing Radical- and Acid-Amplified Cross-Linking
Journal article2024, CHEMISTRY OF MATERIALS, (36) 3, p.1459-1471Publication Reaction Mechanisms and EB Patterning Evaluation of Sn-complex-side-chain Polymer Used for EUV Lithography
Proceedings paper2023, Conference on Advances in Patterning Materials and Processes XL, FEB 27-MAR 01, 2023, p.1249826Publication Reaction mechanisms of Sn-complex-side-chain polymer used for extreme ultraviolet lithography, studied by electron pulse radiolysis and & gamma;-radiolysis
Journal article2023, JAPANESE JOURNAL OF APPLIED PHYSICS, (62) 7, p.Art. 076502Publication Role of metal sensitizers for sensitivity improvement in EUV chemically amplified resist
Journal article2019-01, Journal of Photopolymer Science and Technology, (31) 6, p.747-751Publication Sensitizers in EUV chemically amplified resist: mechanism of sensitivity improvement
Proceedings paper2018, Extreme Ultraviolet (EUV) Lithography IX, 25/02/2018, p.1058307Publication Sensitizers in extreme ultraviolet chemically amplified resists: mechanism of sensitivity improvement
Journal article2019-12, Journal of Micro/Nanolithography MEMS and MOEMS, (17) 4, p.43506