Browsing by Author "Lafferty, Neal"
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Publication Complementary dipole exposure solutions at 0.29k1
Proceedings paper2005, Optical Microlithography XVIII, 27/02/2005, p.327-338Publication Directed self-assembly (DSA) grapho-epitaxy template generation with immersion lithography
Publication Directed self-assembly graphoepitaxy template generation with immersion lithography
Publication EUV based multi-patterning schemes for advanced DRAM nodes
Proceedings paper2022, Conference on Advances in Patterning Materials and Processes XXXIX Part of SPIE Advanced Lithography and Patterning Conference, APR 24-MAY 27, 2022, p.Art. 1205503Publication Exploring alternative EUV mask absorber for iN5 self-aligned block and contact layers
Proceedings paper2019, Photomask Technology 2019, 16/09/2019, p.111481BPublication Gray assist bar OPC
Proceedings paper2004-10, Optical Microlithography XVII, 22/02/2004, p.381-392Publication High NA EUV single patterning of advanced metal logic nodes: Inverse lithography techniques in combination with alternative mask absorbers
Proceedings paper2024, 39th European Mask and Lithography Conference (EMLC), JUN 17-19, 2024, p.Art. 132731MPublication Physically-based compact models for fast lithography simulation
Publication Single Mask Solution to Pattern BLP and SNLP using 0.33NA EUV for Next Generation DRAM Manufacturing
; ; ; Kim, Ryan Ryoung hanProceedings paper2022, International Conference on Extreme Ultraviolet Lithography, SEP 26-29, 2022, p.Art. 122920W