Browsing by Author "Lauerhaas, Jeff"
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Publication A high-performance drying method enabling clustered single wafer wet cleaning
Proceedings paper2000, Symposium on VLSI Technology. Digest of Technical Papers, 13/06/2000, p.56-57Publication A theoretical and experimental study of damage-free BEOL cleaning with megasonic agitation
Publication Clustered single wafer wet cleaning
; ; ; ; Publication Critical issues in post Cu CMP cleaning
Proceedings paper2000, Proceedings of the 9th International Symposium on Semiconductor Manufacturing - ISSM, 26/09/2000, p.415-418Publication Estimation of evaporating water film thickness during different drying processes
Meeting abstract2001, 200th Meeting of the Electrochemical Society: 7th International Symposium on Cleaning Technology in Semiconductor Device Manufac, 2/09/2001Publication Megasonic, non-contact cleaning followed by "Rotagoni" drying of CMP wafers
Proceedings paper2001, Ultra Clean Processing of Silicon Surfaces 2000: Proceedings of the 5th International Conference - UCPSS, 18/09/2000, p.254-254Publication Non-contact post Cu CMP cleaning using megasonic energy
Proceedings paper2001, Ultra Clean Processing of Silicon Surfaces 2000: Proceedings of the 5th International Conference - UCPSS, 18/09/2000, p.39-42Publication Recent advances in wafer cleaning
; ; Publication Reduction of surface metallic contamination through optimized rinsing and single-wafer drying
Proceedings paper2002, Cleaning Technology in Semiconductor Device Manufacturing VII, 4/09/2001, p.91-101Publication Single wafer cleaning and drying: particle removal via a non-contact, non-damaging megasonic clean followed by a high performance "Rotagoni" dry
Proceedings paper2000, Proceedings of the 9th International Symposium on Semiconductor Manufacturing - ISSM, 26/09/2000, p.157-160Publication Single wafer drying
Proceedings paper2001, Wafer Cleaning and Surface Preparation Workshop, 15/05/2001Publication Sub 100nm particle removal with deionized water and a megasonic frequency of 835kHz
Proceedings paper2002, Cleaning Technology in Semiconductor Device Manufacturing VII, 4/09/2001, p.145-146Publication Sub 100nm particle removal with deionized water and a megasonic frequency of ~835kHz
Meeting abstract2001, 200th International Meeting Electrochemical Society: 7th International Symposium on Cleaning Technology in Semiconductor Device, 2/09/2001