Browsing by Author "Lee, Hean-Cheal"
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Publication A study of gate oxide damage due to the plasma etching process on sub-0.25μm technology
Lee, Hean-ChealPHD thesis1999-12Publication Comparative study of porous SOG films with different non-destructive instrumentation
Publication Plasma process induced physical damage on ultra thin gate oxide
Publication Reduction of plasma process induced damage during gate poly etching by using the SiO2 hard maks
Proceedings paper1998, Proceedings of the 3rd International Symposium on Plasma-Induced Damage - P2ID, 4/06/1998, p.72-75Publication The effect of plasma damage and different annealing ambients on the generation of latent interface states
Proceedings paper1998, Proceedings of the 3rd International Symposium on Plasma-Induced Damage - P2ID, 4/06/1998, p.217-220Publication The etching behavior of tungsten (w) with respect to the orientation of the grain boudnary and masking layers
Oral presentation1997, Materials Research Society 1997 Spring Meeting : Symposium on Multilevel Metal Process Integration; April 1-2, 1997; San Francis