Browsing by Author "Manabe, Yukiko"
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Publication Integration issues of polysilicon with high k dielectrics deposited by Atomic Layer Chemical Vapor Deposition
Proceedings paper2002, Semiconductor Silicon 2002. Proceedings of the 9th International Symposium on Silicon Materials Science and Technology, 12/05/2002, p.747-760Publication Mobility reduction due to remote charge scattering in Al2O3/SiO2 gate-stacked MISFETs
Proceedings paper2002, Extended Abstracts of the 2002 International Conference on Solid State Devices - SSDM, 17/09/2002, p.704-705Publication Scaling of high-k dielectrics towards sub-1nm EOT
Proceedings paper2003, IEEE International Symposium on VLSI Technology, Systems, and Applications, 23/04/2003, p.251-254Publication The influence of defects on campatibility and yield of the HfO2-polysilicon gate stack for CMOS integration
Proceedings paper2003, Novel Materials and Processes for Advanced CMOS, 2/12/2002, p.335-340Publication The mechanism of mobility degradation in misfets with Al2O3 gate dielectric