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Browsing by Author "Mani, Antonio"

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    Characterizing and modeling electrical response to light for metal based EUV photoresists

    Vaglio Pret, Alessandro  
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    Kocsis, Michael  
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    De Simone, Danilo  
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    Vandenberghe, Geert  
    Proceedings paper
    2016, Advances in Patterning Materials and Processes XXXIII, 21/02/2016, p.977906
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    Detection, binning, and analysis of defects in a GaN-on-Si process for high brightness light emitting diodes

    Halder, Sandip  
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    Miller, Andy  
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    Osman, Haris  
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    Dutta, Barundeb  
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    Mani, Antonio  
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    Jones, Chris
    Proceedings paper
    2012, 23rd Annual SEMI Advanced Semiconductor Manufacturing Conference - ASMC, 15/05/2012, p.106-109
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    Evolution of lithography-to-etch bias in multi-patterning processes

    Panneerchelvam, Prem
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    Agarwal, Ankur
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    Huard, Chad M. M.
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    Pret, Alessandro Vaglio
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    Mani, Antonio
    Journal article
    2022, JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, (40) 6, p.062601
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    GaN-on-Si process defect detection and analysis for HB-LEDs and power devices

    Halder, Sandip  
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    Stiers, Karen  
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    Kandaswamy, Prem Kumar
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    Rosmeulen, Maarten  
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    Carbonell, Laure
    Proceedings paper
    2013, 24th Annual SEMI Advanced Semiconductor Manufacturing Conference - ASMC, 13/05/2013, p.371-374
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    Interface sharpness in stacked thin film structures: a comparison of soft X-ray reflectometry and transmission electron microscopy

    Ciesielski, Richard
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    Bogdanowicz, Janusz  
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    Loo, Roger  
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    Shimura, Yosuke  
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    Mani, Antonio
    Journal article
    2024, JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3, (23) 4, p.Art. 041405
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    Process window discovery, expansion and control of design hotspots susceptible to overlay failures

    Sah, Kaushik  
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    Cross, Andrew  
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    Mani, Antonio  
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    Van Den Heuvel, Dieter  
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    Foubert, Philippe  
    Proceedings paper
    2017, 28th Annual SEMI Advanced Semiconductor Manufacturing Conference - ASMC, 15/05/2017
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    Soft X-ray reflectometry for the inspection of interlayer roughness in stacked thin film structures

    Ciesielski, Richard
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    Loo, Roger  
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    Shimura, Yosuke  
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    Bogdanowicz, Janusz  
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    Mani, Antonio
    Proceedings paper
    2024, Conference on Metrology, Inspection, and Process Control XXXVIII, FEB 26-29, 2024, p.Art. 1295507
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    XAS photoresists electron/quantum yields study with synchrotron light

    De Schepper, Peter  
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    Vaglio Pret, Alessandro  
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    Hansen, Terje
    ;
    Giglia, Angelo
    ;
    Hoshiko, Kenji
    Proceedings paper
    2015, Advances in Patterning Materials and Processes XXXII, 22/02/2015, p.942507

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