imec Institutional Repository Browsing {{ collection }} by Author "Mogilnikov, K. P."

Publication

Calculation of pore size distribution in the ellipsometric porosimetry: method and reliability

Mogilnikov, K. P.

;

Polovinkin, V. G.

;

Dultsev, F. N.

;

Baklanov, Mikhaïl

Proceedings paper

2000, Low-Dielectric Constant Materials V; 5-9 April 1999; San Francisco, Ca, USA., p.81-86

Publication

Characterisation of porous dielectric films by ellipsometric porosimetry

Baklanov, Mikhaïl

;

Mogilnikov, K. P.

Journal article

2000, Optica Applicata, (30) 4, p.491-496

Publication

Characterisation of porous low dielectric constant films by ellipsometric porosimetry

Baklanov, Mikhaïl

;

Mogilnikov, K. P.

Journal article

2001, Semiconductor Fabtech, 14, p.219-221

Publication

Characterization of low-k dielectric films by ellipsometric porosimetry

Baklanov, Mikhaïl

;

Mogilnikov, K. P.

Oral presentation

2000, MRS Spring Meeting 2000. Symposium D: Materials, Technology, and Reliability for Advanced Interconnects and Low-k Dielectrics

Publication

Characterization of low-k dielectric films by ellipsometric porosimetry

Baklanov, Mikhaïl

;

Mogilnikov, K. P.

Proceedings paper

2001, Materials, Technology, and Reliability for Advanced Interconnects and Low-k Dielectrics, 23/04/2000, p.D4.2.1-D4.2.12

Publication

Comparative study of porous SOG films with different non-destructive instrumentation

Baklanov, Mikhaïl

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Kondoh, Eiichi

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Linskens, Frank

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Gidley, D. W.

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Lee, Hean-Cheal

Proceedings paper

2001, Proceedings of the IEEE 2001 International Interconnect Technology Conference, 4/06/2001, p.189-191

Publication

Comparison of techniques to characterise the density, porosity and elastic modulus of porous low-K SiO2 xerogel films

Murray, C.

;

Flannery, C.

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Streiter, I.

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Schulz, S. E.

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Baklanov, Mikhaïl

;

Mogilnikov, K. P.

Journal article

2002, Microelectronic Engineering, (60) 1_2, p.133-141

Publication

Comparison of techniques to characterize the density, porosity and elastic modules of porous low-k SiO2 xerogel films

Murray, C.

;

Flannery, C.

;

Streiter, I.

;

Schulz, S. E.

;

Baklanov, Mikhaïl

;

Mogilnikov, K. P.

Oral presentation

2001, MAM - European Workshop on Materials for Advanced Metallization; 5-7 March 2001; Sigtuna, Sweden.

Publication

Determination of pore size distribution in thin films by ellipsometric posimetry

Baklanov, Mikhaïl

;

Mogilnikov, K. P.

;

Polovinkin, V. G.

;

Dultsev, F. N.

Journal article

2000, J. Vacuum Science and Technology B, (18) 3, p.1385-1391

Publication

Development of a non-destructive thin film porosimetry: pore size distribution and pore volume of porous silica

Baklanov, Mikhaïl

;

Dultsev, F. N.

;

Kondoh, Eiichi

;

Mogilnikov, K. P.

;

Maex, Karen

;

Wang, Sharon

Proceedings paper

1999, Advanced Metallization Conference in 1998. Proceedings of the Conference;, p.507-512

Publication

Ellipsometric study of the change in the porosity of silica xerogels after surface chemical modification with hexamethyldisilizane

Himcinschi, C.

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Friedrich, M.

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Frühauf, S.

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Streiter, I.

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Schulz, S. E.

;

Gessner, T.

Oral presentation

2001, 11. Tagung Festkörperanalytik. 11th Conference on Solid State Analytics; 25-28 June 2001; Chemnitz.

Publication

Non-destructive characterisation of porosity and pore size distribution in porous low-k dielectric films

Baklanov, Mikhaïl

;

Mogilnikov, K. P.

Proceedings paper

2001, ICSICT - 6th International Conference on Solid-State Integrated Circuit Technology. Proceedings, 22/10/2001, p.352-357

Publication

Non-destructive determination of pore size distribution of low-k porous SOG films

Baklanov, Mikhaïl

;

Kondoh, Eiichi

;

Gidley, D.

;

Lin, E.

;

Wu, Wen

;

Arao, H.

;

Mogilnikov, K. P.

Oral presentation

2000, 60th Japan Society of Applied Physics Autumn Meeting; September 2000; Japan.

Browsing by Author "Mogilnikov, K. P."