Browsing by Author "Nagahara, Seiji"

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Approaches to Enable Patterning of Tight Pitches towards High NA EUV

Tadatomo, Hiroki
;
Dauendorffer, Arnaud
;
Onitsuka, Tomoya
;
Genjima, Hisashi
;
Ido, Yasuyuki
Proceedings paper
2022, Conference on Advanced Etch Technology and Process Integration for Nanopatterning XI Part of SPIE Advanced Lithography and Patterning Conference, APR 24-MAY 27, 2020-2022, p.120560F
EUV Metal Oxide Resist Development Technology for Improved Sensitivity, Roughness and Pattern Collapse Margin for High Volume Manufacturing

Dinh, Cong Que
;
Nagahara, Seiji
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Kuwahara, Yuhei
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Dauendorffer, Arnaud
;
Yoshida, Keisuke
Journal article
2022, JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, (35) 1, p.87-93
EUV resist performance enhancement by UV flood exposure for high NA EUV lithography

Cong Que Dinh
;
Nagahara, Seiji
;
Yoshida, Keisuke
;
Kondo, Yoshihiro
;
Muramatsu, Makoto
Proceedings paper
2021, Conference on Advances in Patterning Materials and Processes XXXVIII Part of SPIE Advanced Lithography Conference, FEB 22-26, 2021, p.116120L
Photosensitized Chemically Amplified Resist (PSCAR) 2.0 for high-throughput and high-resolution EUV lithography: dual photosensitization of acid generation and quencher decomposition by flood exposure

Nagahara, Seiji
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Carcasi, Michael
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Shiraishi, Gosuke
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Nakagawa, Hisashi
;
Dei, Satoshi
Proceedings paper
2017, Advances in Patterning Materials and Processes XXXIV, 26/02/2017, p.101460G
Recent advances in EUV patterning in preparation towards high-NA EUV

Nagahara, Seiji
;
Dauendorffer, Arnaud
;
Thiam, Arame
;
Liu, Xiang
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Kuwahara, Yuhei
;
Dinh, Cong Que
Proceedings paper
2023, Conference on Advances in Patterning Materials and Processes XL, FEB 27-MAR 01, 2023, p.Art. 124981G