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Browsing by Author "Nguyen, Duy"

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    200mm Si/SiGe resonant interband tunneling diodes incorporating delta-doping layers grown by CVD

    Park, Si-Young
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    Anisha, R.
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    Berger, Paul
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    Loo, Roger  
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    Nguyen, Duy
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    Takeuchi, Shotaro
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    Caymax, Matty  
    Meeting abstract
    2009, Abstracts 6th International Conference on Silicon Epitaxy and Heterostructures - ICSI-6, 17/05/2009, p.72-73
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    A 35nm diameter vertical silicon nanowire short-gate tunnelFET

    Vandooren, Anne  
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    Rooyackers, Rita
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    Leonelli, Daniele  
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    Iacopi, Francesca
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    De Gendt, Stefan  
    Proceedings paper
    2009, Nanotechnology Workshop, 13/06/2009
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    A 400GHz fMAX fully self-aligned SiGe:C HBT architecture

    Van Huylenbroeck, Stefaan  
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    Sibaja-Hernandez, Arturo  
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    Venegas, Rafael
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    You, Shuzhen  
    Proceedings paper
    2009-10, IEEE Bipolar/BiCMOS Circuits and Technology Meeting - BCTM, 13/10/2009, p.5-8
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    Analysis of the time-dependent electrical current in reverse-biased p-GeSn/n-Ge mesa diodes

    Baert, Bruno
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    Gupta, Somya
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    Gencarelli, Federica
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    Loo, Roger  
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    Simoen, Eddy  
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    Nguyen, Duy
    Meeting abstract
    2015-09, E-MRS Fall Symposium O: Alternative Semiconductor Integration in Si Microelectronics: Materials, Techniques and Appl., 14/09/2015
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    Arsenic-doped Ge-spiked monoemitter SiGe:C HBTs by means of low-temperature trisilane based epitaxy

    You, Shuzhen  
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    Decoutere, Stefaan  
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    Nguyen, Duy
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    Van Huylenbroeck, Stefaan  
    Oral presentation
    2011, 7th International Conference on Si Epitaxy and Heterostructures - ICSI-7
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    Arsenic-doped Ge-spiked monoemitter SiGe:C heterojunction bipolar transistors by low-temperature trisilane based chemical vapor deposition

    You, Shuzhen  
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    Decoutere, Stefaan  
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    Nguyen, Duy
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    Van Huylenbroeck, Stefaan  
    Journal article
    2012, Thin Solid Films, (520) 8, p.3345-3348
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    Atomic layer doping of phosphorus and arsenic: experimental and atomistic modeling

    Takeuchi, Shotaro
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    Yang, Lijun
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    Nguyen, Duy
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    Loo, Roger  
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    Conard, Thierry  
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    Pourtois, Geoffrey  
    Proceedings paper
    2008, 4th International Workshop on New Group IV Semiconductor Nanoelectronics, 25/09/2008
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    Composition and thickness dependence of GeSn growth by chemical vapor deposition

    Wang, Wei
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    Shimura, Yosuke
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    Nieddu, Thomas
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    Gencarelli, Federica
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    Nguyen, Duy
    Proceedings paper
    2013-06, 8th International Conference on Silicon Epitaxy and Heterostructures - ICSI-8, 2/06/2013, p.51-52
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    Conformal doping of FINFET's: a fabrication and metrology challenge

    Vandervorst, Wilfried  
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    Eyben, Pierre  
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    Mody, Jay
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    Jurczak, Gosia  
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    Nguyen, Duy
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    Takeuchi, Shotaro
    Meeting abstract
    2008, E-MRS Symposium I: Front-End Junction and Contact Formation in Future Silicon/Germanium Based Devices, 26/05/2008
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    Conformal ultra shallow junctions by vapor phase doping with boron

    Nguyen, Duy
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    Leys, Frederik
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    Takeuchi, Shotaro
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    Loo, Roger  
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    Caymax, Matty  
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    Eyben, Pierre  
    Proceedings paper
    2008-05, 4th International SiGe Technology and Device Meeting - ISTDM, 11/05/2008, p.229-230
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    Depth resolution and surface transients in crystalline Silicon at ultra low energies

    Goossens, Jozefien
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    Berghmans, Bart
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    Franquet, Alexis  
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    Nguyen, Duy
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    Delmotte, Joris
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    Geenen, Luc
    Meeting abstract
    2009-09, 17th International Conference on Secondary Ion Mass Spectrometry - SIMS XVII, 14/08/2009, p.247
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    Determination of charge-carrier transport in organic devices by admittance spectroscopy: Application to hole mobility in a-NPD

    Nguyen, Duy
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    Schmeits, Marcel
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    Loebl, Hans-Peter
    Journal article
    2007, Physical Review B, (75) 7, p.75307
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    Electrical characterization of p-GeSn/n-Ge diodes with interface traps under dc and ac regimes

    Baert, Bruno
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    Gupta, Somya
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    Gencarelli, Federica
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    Loo, Roger  
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    Simoen, Eddy  
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    Nguyen, Duy
    Journal article
    2015, Solid-State Electronics, 110, p.65-70
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    Enhancement of the relaxation of SiGe layers by He ion implantation using a delta-Si:C layer

    Buca, D.
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    Goryll, M.
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    Hollaender, B.
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    Trinkaus, H.
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    Mantl, S.
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    Loo, Roger  
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    Nguyen, Duy
    Oral presentation
    2007, MRS 2007 Spring Meeting Symposium F: Semiconductor Defect Engineering - Materials, Synthetic Structures and Devices II
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    Epitaxial Si, SiGe and Ge for high-performance devices

    Loo, Roger  
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    Hikavyy, Andriy  
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    Vincent, Benjamin  
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    Wang, Gang
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    Vanherle, Wendy  
    Oral presentation
    2010, ASM User Meeting
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    Fabrication, characterization and modeling of strained SOI MOSFETs with very large effective mobility

    Driussi, F.
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    Esseni, D.
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    Selmi, L.
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    Schmidt, M.
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    Lemme, M.
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    Kurz, H.
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    Buca, D.
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    Mantl, S.
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    Luysberg, M.
    Proceedings paper
    2007, Proceedings of the 37th European Solid-State Device Research Conference - ESSDERC, 11/09/2007, p.315-318
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    Growth of high quality InP layers in STI trenches on miscut Si (001) substrates

    Wang, Gang
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    Leys, Maarten
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    Nguyen, Duy
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    Loo, Roger  
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    Brammertz, Guy  
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    Richard, Olivier  
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    Bender, Hugo  
    Journal article
    2011, Journal of Crystal Growth, (315) 1, p.32-36
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    Growth of high quality InP layers in STI trenches on Si (001) substrates

    Wang, Gang
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    Nguyen, Duy
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    Leys, Maarten
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    Loo, Roger  
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    Richard, Olivier  
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    Brammertz, Guy  
    Meeting abstract
    2010, 15th International Conference on Metal Organic Vapor Phase Epitaxy - MOVPE, 23/05/2010
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    Growth of III/V materials on large area silicon

    Schineller, Bernd
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    Nguyen, Duy
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    Heuken, Michael
    Proceedings paper
    2010, Graphene, Ge/III-V, and Emerging Materials for Post-CMOS Applications 2, 25/04/2010, p.233-236
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    Heterogeneous integration and fabrication of III-V MOS devices in a 200mm processing environment

    Waldron, Niamh  
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    Nguyen, Duy
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    Lin, Dennis  
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    Brammertz, Guy  
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    Vincent, Benjamin  
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    Firrincieli, Andrea  
    Proceedings paper
    2011, Dielectrics in Nanosystems -and- Graphene, Ge/III-V, Nanowires and Emerging Materials for Post-CMOS Applications 3, 1/05/2011, p.299-309
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