Browsing by Author "Nguyen, Duy"
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Publication 200mm Si/SiGe resonant interband tunneling diodes incorporating delta-doping layers grown by CVD
;Park, Si-Young ;Anisha, R. ;Berger, Paul; ;Nguyen, Duy ;Takeuchi, ShotaroMeeting abstract2009, Abstracts 6th International Conference on Silicon Epitaxy and Heterostructures - ICSI-6, 17/05/2009, p.72-73Publication A 35nm diameter vertical silicon nanowire short-gate tunnelFET
Proceedings paper2009, Nanotechnology Workshop, 13/06/2009Publication A 400GHz fMAX fully self-aligned SiGe:C HBT architecture
Proceedings paper2009-10, IEEE Bipolar/BiCMOS Circuits and Technology Meeting - BCTM, 13/10/2009, p.5-8Publication Analysis of the time-dependent electrical current in reverse-biased p-GeSn/n-Ge mesa diodes
Meeting abstract2015-09, E-MRS Fall Symposium O: Alternative Semiconductor Integration in Si Microelectronics: Materials, Techniques and Appl., 14/09/2015Publication Arsenic-doped Ge-spiked monoemitter SiGe:C HBTs by means of low-temperature trisilane based epitaxy
Oral presentation2011, 7th International Conference on Si Epitaxy and Heterostructures - ICSI-7Publication Arsenic-doped Ge-spiked monoemitter SiGe:C heterojunction bipolar transistors by low-temperature trisilane based chemical vapor deposition
Journal article2012, Thin Solid Films, (520) 8, p.3345-3348Publication Atomic layer doping of phosphorus and arsenic: experimental and atomistic modeling
Proceedings paper2008, 4th International Workshop on New Group IV Semiconductor Nanoelectronics, 25/09/2008Publication Composition and thickness dependence of GeSn growth by chemical vapor deposition
;Wang, Wei ;Shimura, Yosuke ;Nieddu, Thomas ;Gencarelli, FedericaNguyen, DuyProceedings paper2013-06, 8th International Conference on Silicon Epitaxy and Heterostructures - ICSI-8, 2/06/2013, p.51-52Publication Conformal doping of FINFET's: a fabrication and metrology challenge
Meeting abstract2008, E-MRS Symposium I: Front-End Junction and Contact Formation in Future Silicon/Germanium Based Devices, 26/05/2008Publication Conformal ultra shallow junctions by vapor phase doping with boron
Proceedings paper2008-05, 4th International SiGe Technology and Device Meeting - ISTDM, 11/05/2008, p.229-230Publication Depth resolution and surface transients in crystalline Silicon at ultra low energies
Meeting abstract2009-09, 17th International Conference on Secondary Ion Mass Spectrometry - SIMS XVII, 14/08/2009, p.247Publication Determination of charge-carrier transport in organic devices by admittance spectroscopy: Application to hole mobility in a-NPD
;Nguyen, Duy ;Schmeits, MarcelLoebl, Hans-PeterJournal article2007, Physical Review B, (75) 7, p.75307Publication Electrical characterization of p-GeSn/n-Ge diodes with interface traps under dc and ac regimes
Journal article2015, Solid-State Electronics, 110, p.65-70Publication Enhancement of the relaxation of SiGe layers by He ion implantation using a delta-Si:C layer
Oral presentation2007, MRS 2007 Spring Meeting Symposium F: Semiconductor Defect Engineering - Materials, Synthetic Structures and Devices IIPublication Epitaxial Si, SiGe and Ge for high-performance devices
Oral presentation2010, ASM User MeetingPublication Fabrication, characterization and modeling of strained SOI MOSFETs with very large effective mobility
;Driussi, F. ;Esseni, D. ;Selmi, L. ;Schmidt, M. ;Lemme, M. ;Kurz, H. ;Buca, D. ;Mantl, S.Luysberg, M.Proceedings paper2007, Proceedings of the 37th European Solid-State Device Research Conference - ESSDERC, 11/09/2007, p.315-318Publication Growth of high quality InP layers in STI trenches on miscut Si (001) substrates
;Wang, Gang ;Leys, Maarten ;Nguyen, Duy; ; ; Journal article2011, Journal of Crystal Growth, (315) 1, p.32-36Publication Growth of high quality InP layers in STI trenches on Si (001) substrates
Meeting abstract2010, 15th International Conference on Metal Organic Vapor Phase Epitaxy - MOVPE, 23/05/2010Publication Growth of III/V materials on large area silicon
;Schineller, Bernd ;Nguyen, DuyHeuken, MichaelProceedings paper2010, Graphene, Ge/III-V, and Emerging Materials for Post-CMOS Applications 2, 25/04/2010, p.233-236Publication Heterogeneous integration and fabrication of III-V MOS devices in a 200mm processing environment
; ;Nguyen, Duy; ; ; Proceedings paper2011, Dielectrics in Nanosystems -and- Graphene, Ge/III-V, Nanowires and Emerging Materials for Post-CMOS Applications 3, 1/05/2011, p.299-309
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