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Browsing by Author "Okuno, Yasutoshi"

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    Analysis of the pre-epi bake conditions on the defect creation in recessed Si1-xGex S/D junctions

    Bargallo Gonzalez, Mireia
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    Thomas, Nicole
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    Simoen, Eddy  
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    Verheyen, Peter  
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    Hikavyy, Andriy  
    Proceedings paper
    2007, Analytical and Diagnostic Techniques for Semiconductor Materials, Devices, and Processes 7, 7/10/2007, p.47-53
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    Influence of STI trench fill and dummy design on CMP behavior

    Ong, Patrick  
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    Devriendt, Katia  
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    Redolfi, Augusto  
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    Okuno, Yasutoshi
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    Hernandez, Jose Luis  
    Proceedings paper
    2007, International Conference on Planarization / CMP Technology - ICPT, 25/10/2007, p.99-104
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    Junction anneal sequence optimization for advanced high-k / metal gate CMOS technology

    Ortolland, Claude
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    Ragnarsson, Lars-Ake  
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    Kerner, Christoph  
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    Chiarella, Thomas  
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    Rosseel, Erik  
    Proceedings paper
    2009, 9th International Workshop on Junction Technology - IWJT, 11/06/2009
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    Novel process to pattern selectively dual dielectric capping layers using soft-mask only

    Schram, Tom  
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    Kubicek, Stefan  
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    Rohr, Erika
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    Brus, Stephan  
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    Vrancken, Christa  
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    Chang, Shou-Zen
    Proceedings paper
    2008, Symposium on VLSI Technology Digest of Technical Papers, 17/06/2008, p.44-45
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    Optimized ultra-low thermal budget process flow for advanced high-K / metal gate first CMOS using laser-annealing technology

    Ortolland, Claude
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    Ragnarsson, Lars-Ake  
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    Favia, Paola  
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    Richard, Olivier  
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    Kerner, Christoph  
    Proceedings paper
    2009, Symposium on VLSI Technology, 15/06/2009, p.38-39
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    Strain enhanced Low-VT CMOS featuring La/Al-doped HfSiO/TaC and 10ps invertor delay

    Kubicek, Stefan  
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    Schram, Tom  
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    Rohr, Erika
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    Paraschiv, Vasile  
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    Vos, Rita  
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    Demand, Marc  
    Proceedings paper
    2008, Symposium on VLSI Technology Digest of Technical Papers, 17/06/2008, p.130-131
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    Stress memorization technique – fundamental understanding and low-cost integration for advanced CMOS technology using a nonselective process

    Ortolland, Claude
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    Okuno, Yasutoshi
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    Verheyen, Peter  
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    Kerner, Christoph  
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    Stapelmann, Chris
    Journal article
    2009, IEEE Transactions on Electron Devices, (56) 8, p.1690-1697
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    Thermally-stable high effective work function TaCN thin films for metal gate electrode applications

    Adelmann, Christoph  
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    Meersschaut, Johan  
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    Ragnarsson, Lars-Ake  
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    Conard, Thierry  
    Journal article
    2009, Journal of Applied Physics, (105) 5, p.53516

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