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Browsing by Author "Osaki, Mayuka"

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    Advanced CD-SEM metrology to improve total process control performance for hyper-NA lithography

    Osaki, Mayuka
    ;
    Tanaka, Maki
    ;
    Shishido, Chie
    ;
    Ishimoto, Toru
    ;
    Hasegawa, Norio
    ;
    Sekiguchi, Kohei
    Proceedings paper
    2008, Metrology, Inspection, and Process Control for Microlithography XXII, 24/02/2008, p.69221B
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    Application of model-based library approach to photoresist pattern shape measurement in advenced lithography

    Yasui, Naoki
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    Isawa, Miki
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    Ishimoto, Toru
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    Sekiguchi, Kohei
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    Tanaka, Maki
    ;
    Osaki, Mayuka
    Proceedings paper
    2010, Metrology, Inspection and Process Control for Microlithography XXIV, 21/02/2010, p.76382O
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    Cu Pad Surface Height Evaluation Technique by In-line SEM for Wafer Hybrid Bonding

    Kasai, Hiroaki
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    Osaki, Mayuka
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    Hasumi, Kazuhisa
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    Mise, Nobuyuki
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    Tanaka, Maki
    Proceedings paper
    2024, Conference on Metrology, Inspection, and Process Control XXXVIII, FEB 26-29, 2024, p.Art. 129551N
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    High-throughput in-line SEM Metrology for Cu Pad Nanotopography for Hybrid Bonding Applications

    Tunca Altintas, Bensu  
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    Saib, Mohamed  
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    Moussa, Alain  
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    Chew, Soon Aik  
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    Zhang, Boyao  
    ;
    De Vos, Joeri  
    Proceedings paper
    2024, 10th IEEE Electronics System-Integration Technology Conference (ESTC), SEP 11-13, 2024
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    In-line SEM Evaluation Technique for Cu Pad Nanotopography for Hybrid Bonding Applications

    Kasai, Hiroaki
    ;
    Hasumi, Kazuhisa
    ;
    Mise, Nobuyuki
    ;
    Osaki, Mayuka
    ;
    Chew, Soon Aik  
    Proceedings paper
    2024, 13th IEEE CPMT Symposium Japan, NOV 13-15, 2024, p.92-95
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    Performance verification of resist loss measurement method using top-view CD-SEM images for hyper-NA lithography

    Osaki, Mayuka
    ;
    Tanaka, Maki
    ;
    Shishido, Chie
    ;
    Cheng, Shaunee
    ;
    Laidler, David  
    ;
    Ercken, Monique  
    Proceedings paper
    2009, Metrology, Inspection, and Process Control for Microlithography XXIII, 23/02/2009, p.727211

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