Browsing by Author "Osaki, Mayuka"
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Publication Advanced CD-SEM metrology to improve total process control performance for hyper-NA lithography
;Osaki, Mayuka ;Tanaka, Maki ;Shishido, Chie ;Ishimoto, Toru ;Hasegawa, NorioSekiguchi, KoheiProceedings paper2008, Metrology, Inspection, and Process Control for Microlithography XXII, 24/02/2008, p.69221BPublication Application of model-based library approach to photoresist pattern shape measurement in advenced lithography
;Yasui, Naoki ;Isawa, Miki ;Ishimoto, Toru ;Sekiguchi, Kohei ;Tanaka, MakiOsaki, MayukaProceedings paper2010, Metrology, Inspection and Process Control for Microlithography XXIV, 21/02/2010, p.76382OPublication Cu Pad Surface Height Evaluation Technique by In-line SEM for Wafer Hybrid Bonding
;Kasai, Hiroaki ;Osaki, Mayuka ;Hasumi, Kazuhisa ;Mise, NobuyukiTanaka, MakiProceedings paper2024, Conference on Metrology, Inspection, and Process Control XXXVIII, FEB 26-29, 2024, p.Art. 129551NPublication High-throughput in-line SEM Metrology for Cu Pad Nanotopography for Hybrid Bonding Applications
; ; ; ; ; Proceedings paper2024, 10th IEEE Electronics System-Integration Technology Conference (ESTC), SEP 11-13, 2024Publication In-line SEM Evaluation Technique for Cu Pad Nanotopography for Hybrid Bonding Applications
Proceedings paper2024, 13th IEEE CPMT Symposium Japan, NOV 13-15, 2024, p.92-95Publication Performance verification of resist loss measurement method using top-view CD-SEM images for hyper-NA lithography
Proceedings paper2009, Metrology, Inspection, and Process Control for Microlithography XXIII, 23/02/2009, p.727211