Browsing by Author "Parisini, A."

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Comparison of electrical measurements with structural analysis of thin high-k hafnium-based films

Hourdakis, E.
;
Theodoropoulou, M.
;
Nassiopoulou, A.G.
;
Parisini, A.
;
Reading, M.A.
Proceedings paper
2009, Analytical Techniques for Semiconductor Materials and Process Characterization 6 - ALTECH, 4/10/2009, p.363-372
Comparison of electrical measurements with structural analysis of thin high-k hafnium-based films

Hourdakis, E.
;
Theodoropoulou, M.
;
Nassiopoulou, A.G.
;
Parisini, A.
;
Reading, M.A.
Meeting abstract
2009, 216th ECS Meeting, 4/10/2009, p.1995
High depth resolution depth profile analysis of ultra thin high-k Hf based films using MEIS compared with XTEM, XRF, SE and XPS

van den Berg, J.A.
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Reading, M.A.
;
Parisini, A.
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Kolbe, M.
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Beckhoff, B.
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Ladas, S.
;
Petrik, P.
Meeting abstract
2009, 216th ECS Meeting, 4/10/2009, p.1994
High depth resolution depth profile analysis of ultra thin high-k Hf based films using MEIS compared with XTEM, XRF, SE and XPS

van den Berg, J.A.
;
Reading, M. A.
;
Parisini, A.
;
Kolbe, M.
;
Beckhoff, B.
;
Ladas, S.
;
Fried, M.
Proceedings paper
2009, Analytical Techniques for Semiconductor Materials and Process Characterization 6, 4/10/2009, p.349-361
High resolution medium energy ion scattering (MEIS) analysis for the quantitative depth profiling of ultra thin high-k layers

Reading, M. A.
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van den Berg, J. A.
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Zalm, P. C.
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Armour, D. G.
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Bailey, P.
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Noakes, T. C. Q.
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Parisini, A.
Journal article
2010, Journal of Vacuum Science and Technology B, (28) 1, p.C1C65-C1C70