Browsing by Author "Rochat, N."
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Publication Infrared interface analysis of high-k dielectrics deposited by atomic layer chemical vapour deposition
Proceedings paper2001, Extended Abstracts of the International Workshop on Gate Insulator - IWGI, 1/11/2001, p.226-229Publication Integration issues in step and repeat UV nanoimprint lithography
Publication Physical characterization of mixed HfAlOx layers by complementary analysis techniques
Journal article2004, Materials Science and Engineering B, 109, p.60-63Publication Physical characterization of thin HfO2 layers by the combined analysis with complementary techniques
Proceedings paper2003, Analytical Techniques for Semiconductor Materials and Processes, 27/04/2003, p.223-232Publication Use of MIR-FTIR and k-value measurements to assess potential solutions to reduce damage during porous low-k integration
Proceedings paper2009, International Semiconductor Technology Conference - ISTC/CSTIC, 19/03/2009, p.275-280