Browsing by Author "Sano, Ken-Ichi"
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Publication Aging phenomena in the removal of nano-particles from Si wafers
; ; Proceedings paper2008, Ultra Clean Processing of Semiconductor Surfaces VIII - UCPSS, 18/09/2006, p.151-154Publication All wet photoresist strip by solvent aerosol spray
Oral presentation2008, 9th International Symposium on Ultra Clean Processing of Semiconductor Surfaces - UCPSSPublication Application of single-wafer wet cleaning prior to epitaxial SiGe process
Journal article2009, Solid State Phenomena, 145-146, p.173-176Publication Damage clustering and damage-size distributions after megasonic cleaning
Proceedings paper2007, Cleaning and Surface Conditioning Technology in Semiconductor Device Manufacturing 10, 7/10/2007, p.87-93Publication Damage review on gate stack test structures after high-velocity aerosol cleaning
; ; ; Janssens, TomProceedings paper2007, Sematech Surface Preparation and Cleaning Conference, 25/04/2007Publication Impact of galvanic corrosion on metal gate stacks
Oral presentation2008, 9th International Symposium on Ultra Clean Processing of Semiconductor Surfaces - UCPSSPublication Low temperature pre-epi treatment: critical parameters to control interface contamination
Proceedings paper2008, Nanotechnologies Workshop Covering EC-funded R&D on Characterization, Process Technology and Equipment Assessment, 6/10/2008Publication Low temperature pre-epi treatment: critical parameters to control interface contamination
Oral presentation2008, 9th International Symposium on Ultra Clean Processing of Semiconductor Surfaces - UCPSSPublication Particle removal from micrometer-sized trenches using high-velocity-aerosol cleaning and comparison with megasonic tank cleaning
Proceedings paper2007, Cleaning and Surface Conditioning Technology in Semiconductor Device Manufacturing 10, 7/10/2007, p.55-60Publication Removal of nano-particles by mixed-fluid jet: evaluation of cleaning performance and comparison with megasonic
Proceedings paper2008, Ultra Clean Processing of Semiconductor Surfaces VIII - UCPSS, 18/09/2006, p.193-196Publication Single-wafer wet cleaning for a high particle removal efficiency on hydrophobic surface
Proceedings paper2005, Cleaning Technology in Semiconductor Device Manufacturing IX, 16/10/2005, p.134-141Publication Spray systems for cleaning during semiconductor manufacturing
Oral presentation2008, 22nd European Conference on Liquid Atomization and Spray Systems