Browsing by Author "Sayan, Safak"
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Publication BEOL compatible WS2 transistors fully fabricated in a 300 mm pilot line
Proceedings paper2017, Silicon Nanoelectronics Workshop - SNW, 4/07/2017, p.139-140Publication Contact hole multiplication using grapho-epitaxy directed self-assembly: process choices, template optimization, and placement accuracy
Oral presentation2014, Photomask Technology (BACUS 2014)Publication Controlled sulfurization process for the synthesis of large area MoS2 films and MoS2-WS2 heterostructures
Journal article2016, Advanced Materials Interfaces, (3) 4, p.DOI: 10.1002/adPublication Defectivity study on dry development rinse process (DDRP)
; ; ; ; Publication Design and benchmarking of hybrid CMOS-spin wave device circuits compared to 10nm CMOS
Proceedings paper2015, IEEE 15th International Conference on Nanotechnology - IEEE-NANO, 27/07/2015Publication Dielectric properties of spin-on metal oxides and their applications for 2D semiconductor devices
Oral presentation2016, SPIE Advanced Lithography ConferencePublication Directed self-assembly process integration – fin patterning
Proceedings paper2015, Advances in Patterning Materials and Processes XXXII, 22/02/2015, p.94250RPublication Directed self-assembly process integration – fin patterning approaches and challenges
Proceedings paper2014, Advances in Resist Materials and Processing Technology XXXI, 23/02/2014, p.90510MPublication Dry development rinse process for ultimate resolution Improvement via pattern collapse mitigation
Proceedings paper2015, Advances in Patterning Materials and Processes XXXII, 22/02/2015, p.942516Publication DSA as a complementary lithography technique for contact hole patterning
Proceedings paper2013, EUVL Symposium, 6/10/2013Publication Enhancing etch contrast in DSA block copolymer films with sequential infiltration synthesis on 300mm Si substrates
Meeting abstract2014, SPIE Advanced Lithography, 22/02/2015Publication Etch challenges for chemo-expitaxy Directed Self-Assembly (DSA) LiNe flow in Fin patterning
Meeting abstract2016, Plasma Etch and Strip in Microtechnology - PESM, 9/05/2016Publication EUV extendibility via dry development rinse process
Proceedings paper2016, Extreme Ultraviolet (EUV) Lithography VII, 22/02/2016, p.977610Publication Fabrication of magnetic tunnel junctions connected through a continuous free layer to enable spin logic devices
Journal article2018, Japanese Journal of Applied Physics, (57) 4S, p.04FN01Publication Graphene wires as alternative interconnects
Proceedings paper2015, IEEE International Interconnect Technology Conference and IEEE Materials for Advanced Metallization Conference - IITC/MAM, 18/05/2015, p.317-320Publication High volume manufacturing compatible dry development rinse process (DDRP): patterning and defectivity performance for EUVL
Proceedings paper2017, Extreme Ultraviolet (EUV) Lithography VIII, 26/02/2017, p.101430UPublication Impact of sequential infiltration synthesis on pattern fidelity of DSA lines
; ; ; ; ; Proceedings paper2015, Advances in Patterning Materials and Processes XXXII, 22/02/2015, p.94250NPublication Implementation of DSA for electrical test vehicles at the 7 nm node
Proceedings paper2015, E-MRS Spring Meeting, 11/05/2015Publication Integration challenges of spin torque majority gatelogic
Oral presentation2016, IEDM Special MRAM PosterPublication Integration of interconnected magnetic tunnel junctions for spin torque majority gates
Proceedings paper2017, 49th International Conferece on Solid State Devices and Materials - SSDM, 19/09/2017