Browsing by Author "Shindo, Hiroyuki"
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Publication Dry Resist Metrology Readiness for High-NA EUVL
Proceedings paper2023, Conference on Metrology, Inspection, and Process Control XXXVII, FEB 27-MAR 02, 2023, p.Art. 1249612Publication High accuracy OPC-modeling by using advanced CD-SEM based contours in the next generation lithography
Publication High-accuracy optical proximity correction modeling using advanced critical dimension scanning electron microscope-based contours in next-generation lithography
Publication High-precision contouring from SEM image in 32-nm lithography and beyond
Publication Regularized Autoencoder for The Analysis of Multivariate Metrology Data
Proceedings paper2022, Conference on Metrology, Inspection, and Process Control XXXVI Part of SPIE Advanced Lithography and Patterning Conference, FEB 24-MAY 27, 2022, p.Art. 120530V