Browsing by Author "Shite, Hideo"
- Results per page
- Sort Options
Publication EUV baseline process optimizations for NXE:3100 evaluation
Proceedings paper2011, International Symposium on Extreme Ultraviolet Lithography - EUVL, 17/10/2011Publication EUV process sensitivities and optimizations for track processing
Proceedings paper2010, International Symposium on Extreme Ultraviolet Lithography, 18/10/2010Publication EUV processing investigation on state-of-the-art coater/developer system
Proceedings paper2011, Extreme Ultravoiolet (EUV) Lithography II, 27/02/2011, p.796937Publication EUV reolution-LWR-sensitivity performance tradeoffs for a polymer bound PAG resist
Oral presentation2010, 54th International conference on Electron, Ion and Photon Beam Technology and Nanofabrication - EIPBNPublication EUV RLS performance tradeoffs for a polymer bound PAG resist
Proceedings paper2010, Advances in Resist Materials and Processing Technology XXVII, 21/02/2010, p.76390MPublication EUV RLS performance tradeoffs for a polymer bound PAG resist process
Proceedings paper2009, International Symposium on Extreme Ultraviolet Lithography, 18/10/2009Publication Further investigation of EUV process sensitivities for wafer track processing
Proceedings paper2010, Extreme Ultraviolet (EUV) Lithography, 21/02/2010, p.763630Publication Latest cluster performance for EUV lithography
Proceedings paper2012, Extreme Ultraviolet (EUV) Lithography III, 12/02/2012, p.83222YPublication LWR reduction by novel lithographic and etch techniques
Proceedings paper2010, Advances in Resist Materials and Processing Technology XXVII, 21/02/2010, p.763914Publication Process evaluation and optimization for EUV manufacturing
Oral presentation2012, International symposium on Extrem Ultraviolet Lithography - EUVLPublication Resist coating and developing process technology toward EUV manufacturing sub 7nm node
Publication Resolution-linewidth roughness-sensitivity performance tradeoffs for an extreme ultraviolet polymer bound photo-acid generator resist
Journal article2011, Journal of Micro/Nanolithography MEMS and MOEMS, (10) 1, p.13017Publication Technology for defectivity improvement in resist coating and developing process in EUV lithography process
Publication Track processing optimizations for different EUV resist platforms: preparing for a 3300 baseline process
Proceedings paper2013, Extreme Ultraviolet (EUV) Lithography IV, 24/02/2013, p.86792TPublication Understanding EUV resist dissolution characteristics and its impact to RLS limitations
Proceedings paper2011, Extreme Ultraviolet (EUV) Lithography II, 27/02/2011, p.796911Publication Understanding RLS limitations for EUV pre-production stages ; impact of resist dissolution
Proceedings paper2010, International Symposium on Extreme Ultraviolet Lithography, 18/10/2010