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Browsing by Author "Somervell, Mark"

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    Addressing the challenges of Directed Self Assembly implementation

    Gronheid, Roel  
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    Pollentier, Ivan  
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    Younkin, Todd
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    Somervell, Mark
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    Nafus, Kathleen  
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    Hooge, Josh
    Proceedings paper
    2011, International Symposium on Lithography Extensions, 20/10/2011
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    Advances and challenges in dual-tone development process optimization

    Fonseca, Carlos
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    Somervell, Mark
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    Scheer, Steven  
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    Printz, Wallace
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    Nafus, Kathleen  
    Proceedings paper
    2009, Optical Microlithography XXII, 22/02/2009, p.72740I
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    Advances in dual-tone development for pitch frequency doubling

    Fonseca, Carlos
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    Somervell, Mark
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    Scheer, Steven  
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    Kuwahara, Yuhei
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    Nafus, Kathleen  
    Proceedings paper
    2010, Optical Microlithography XXIII, 21/02/2010, p.76400E
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    Advances in process optimization for dual-tone development as a double patterning technique

    Fonseca, Carlos
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    Somervell, Mark
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    Bernard, Sophie
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    Hatakeyama, Shinichi
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    Nafus, Kathleen  
    Proceedings paper
    2008, 5th International Symposium on Immersion Lithography Extensions, 22/09/2008
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    All track directed self-assembly of block copolymers: process flow and origin of defects

    Rincon Delgadillo, Paulina  
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    Gronheid, Roel  
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    Thode, Christopher J.
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    Wu, Hengpeng
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    Cao, Yi
    Proceedings paper
    2012, Alternative Lithographic Technologies IV, 12/02/2012, p.83230D
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    Comparison of directed self-assembly integrations

    Somervell, Mark
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    Gronheid, Roel  
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    Hooge, Joshua
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    Nafus, Kathleen  
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    Rincon Delgadillo, Paulina  
    Proceedings paper
    2012, Advances in Resist Materials and Processing Technology XXIX, 12/02/2012, p.83250G
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    Contact hole CD uniformity repair through directed self-assembly of cylindrical phase block copolymers

    Gronheid, Roel  
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    Singh, Arjun  
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    Chan, BT  
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    Rincon Delgadillo, Paulina  
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    Nealey, Paul
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    Younkin, Todd
    Oral presentation
    2012, MRS Fall M eeting Symposium S: Directed Self-Assembly for Nanopatterning
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    Defect capture sensitivity in 14 nm half-pitch line/space DSA patterns

    Pathangi Sriraman, Hari
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    Gronheid, Roel  
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    Van Den Heuvel, Dieter  
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    Rincon Delgadillo, Paulina  
    Meeting abstract
    2014, Micro and Nano Engineering Conference - MNE, 22/09/2014
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    Defect reduction and defect stability in imec's 14nm half pitch chemo-epitaxy DSA flow

    Gronheid, Roel  
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    Rincon Delgadillo, Paulina  
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    Pathangi Sriraman, Hari
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    Van Den Heuvel, Dieter  
    Proceedings paper
    2014, Alternative Lithographic Technologies VI, 24/02/2014, p.904905
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    Determination of critical parameters for control of directed self-assembly of block copolymers using frequency multiplication

    Rincon Delgadillo, Paulina  
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    Nealey, Paul
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    Gronheid, Roel  
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    Nafus, Kathleen  
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    Somervell, Mark
    Oral presentation
    2012, 38th International Conference on Micro and NanoEngineering - MNE
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    Determination of critical parameters for control of directed self-assembly of block copolymers using frequency multiplication

    Rincon Delgadillo, Paulina  
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    Gronheid, Roel  
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    Thode, Christopher
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    Wu, Hengpeng
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    Cao, Yi
    Oral presentation
    2012, Conference on Photopolymer Science and Technology
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    DSA materials contributions to the defectivity performance of the 14nm half-pitch LiNe flow @ imec

    Pathangi Sriraman, Hari
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    Vaid, Varun
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    Chan, BT  
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    Vandenbroeck, Nadia  
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    Li, Jin
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    Hong, Sung Eun
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    Cao, Yi
    Proceedings paper
    2016, Alternative Lithographic Technologies VIII, 20/02/2016, p.97770G
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    EUV RLS performance tradeoffs for a polymer bound PAG resist process

    Rathsack, Ben
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    Hooge, Josh
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    Somervell, Mark
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    Scheer, Steve
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    Nafus, Kathleen  
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    Shite, Hideo
    Proceedings paper
    2009, International Symposium on Extreme Ultraviolet Lithography, 18/10/2009
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    Evaluation of integration schemes for contact-hole grapho-epitaxy DSA: a study of substrate and template affinity control

    Romo Negreira, Ainhoa  
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    Younkin, Todd
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    Gronheid, Roel  
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    Demuynck, Steven  
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    Vandenbroeck, Nadia  
    Proceedings paper
    2014, Alternative Lithographic Technologies VI, 23/02/2014, p.90491L
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    Frequency mulitiplication of lamellar phase block copolymers with grapho-epitaxy directed self-assembly sensitivity to prepattern

    Gronheid, Roel  
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    Rincon Delgadillo, Paulina  
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    Younkin, Todd
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    Pollentier, Ivan  
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    Somervell, Mark
    Journal article
    2012, Journal of Micro/Nanolithography MEMS and MOEMS, (11) 3, p.31303
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    Implementation of directed self-assembly of block copolymers in the fab for defectivity analysis

    Rincon Delgadillo, Paulina  
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    Nealey, Paul
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    Gronheid, Roel  
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    Matsunaga, Koichi
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    Somervell, Mark
    Oral presentation
    2012, FujiFilm Litho Workshop
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    Implementation of self-assembly in a 300mm processing environment

    Gronheid, Roel  
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    Rincon Delgadillo, Paulina  
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    Nealey, Paul
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    Younkin, Todd
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    Matsunaga, Koichi
    Oral presentation
    2012, IEEE Litho Workshop
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    Implementation of templated DSA for via layer patterning at the 7 nm node

    Gronheid, Roel  
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    Doise, Jan  
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    Bekaert, Joost  
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    Chan, BT  
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    Karageorgos, Ioannis
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    Ryckaert, Julien  
    Proceedings paper
    2015, Alternative Lithographic Technologies VII, 23/02/2015, p.942305
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    Kinetics of defect annihilation in directed self-assembly of block copolymers using chemically nano-patterned surfaces

    Rincon Delgadillo, Paulina  
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    Gronheid, Roel  
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    Lin, Guanyang
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    Cao, Yi
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    Romo, Ainhoa
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    Somervell, Mark
    Meeting abstract
    2014, SPIE Advanced Lithography 2014, 23/02/2014
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    Origin of defect in directed self-assembly of block copolymers using feature multiplication

    Rincon Delgadillo, Paulina  
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    Harukawa, Ryoto
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    Parnell, Doni
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    Lee, Yu-tsung
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    Chan, BT  
    ;
    Lin, Guanyang
    Proceedings paper
    2013, IEEE Litho Workshop, 11/11/2013
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