Browsing by Author "Srinivasan, Purushothaman"
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Publication Channel length and oxide thickness scaling effects on low-frequency (1/f) noise in metal/high-k sub-micron MOSFETs
Proceedings paper2005, Proceedings of the 8th Annual Workshop on Semiconductor Advances Future Electronics and Sensors - SAFE, 17/11/2005, p.133-138Publication Effect of nitridation on l/f noise in n-MOSFETs with high-k dielectric
Meeting abstract2005, Meeting Abstracts 208th Meeting of the Electrochemical Society, 16/10/2005, p.568Publication Gate-dielectric interface effects in low frequency (1/f) noise in p-MOSFETs with high-K dielectrics
Proceedings paper2005, International Semiconductor Device Research Symposium - ISDRS, 7/12/2005Publication Impact of gate material on low-frequency noise of n-MOSFETs with 1.5 nm SiON gate dielectric: testing the limits of the number fluctuations theory
Proceedings paper2005, Noise and Fluctuations: 18th International Conference on Noise and Fluctuations - ICNF, 19/09/2005, p.231-234Publication Impact of high-K gate stack material with metal gates on LF noise in n- and p MOSFETs
Journal article2005, Microelectronic Engineering, 80, p.226-229Publication Impact of the gate-electrode/dielectric interface on the low-frequency noise of thin gate oxide n-channel metal-oxide-semiconductor field-effect transistors
Journal article2007, Solid-State Electronics, (51) 4, p.627-632Publication Interfacial layer quality effects on low-frequency noise (1/f) in p-MOSFETs with advanced gate stacks
Journal article2007, Microelectronics Reliability, (47) 4_5, p.501-504Publication Mixed-signal and noise properties of nMOSFETs with HfSiON/TaN gate stacks
Proceedings paper2005, Proceedings of the 35th European Solid-State Device Research Conference - ESSDERC, 13/09/2005, p.105-108