Repository logo Institutional repository
  • Communities & Collections
  • Browse
  • Site
Search repository
High contrast
  1. Home
  2. Browse by Author

Browsing by Author "Sutcliffe, Victor"

Filter results by typing the first few letters
Now showing 1 - 12 of 12
  • Results Per Page
  • Sort Options
  • Loading...
    Thumbnail Image
    Publication

    Atomic layer deposited barriers for copper interconnects

    Schuhmacher, Jorg
    ;
    Martin Hoyas, Ana
    ;
    Ernur, Didem  
    ;
    Tokei, Zsolt  
    ;
    Travaly, Youssef
    Meeting abstract
    2004, AVS 51 International Symposium, 14/11/2004, p.TF-MoM1
  • Loading...
    Thumbnail Image
    Publication

    Atomic layer deposition of barriers for interconnect

    Besling, Wim
    ;
    Satta, Alessandra
    ;
    Schuhmacher, Jörg
    ;
    Abell, Thomas
    ;
    Sutcliffe, Victor
    Proceedings paper
    2002, Proceedings of the IEEE International Interconnect Technology Conference, 3/06/2002, p.288-291
  • Loading...
    Thumbnail Image
    Publication

    Comprehensive electromigration studies of dual-damascene Cu interconnects with ALD WCxNy barriers

    Bruynseraede, Christophe
    ;
    Fisher, A.H.
    ;
    Ungar, F.
    ;
    Schuhmacher, Jorg
    ;
    Sutcliffe, Victor
    Proceedings paper
    2004, Proceedings of the IEEE International Interconnect Technology Conference, 7/06/2004, p.12-14
  • Loading...
    Thumbnail Image
    Publication

    Corrosion and inhibition of WNxCy barrier during chemical mechanical planarization

    Ernur, Didem  
    ;
    Terzieva, Valentina  
    ;
    Schuhmacher, Jorg
    ;
    Sutcliffe, Victor
    ;
    Whelan, Caroline
    Journal article
    2005, Journal of the Electrochemical Society, (152) 12, p.B512-B518
  • Loading...
    Thumbnail Image
    Publication

    Impact of the barrier/dielectric interface quality on reliability of Cu porous-low-k interconnects

    Tokei, Zsolt  
    ;
    Sutcliffe, Victor
    ;
    Demuynck, Steven  
    ;
    Iacopi, Francesca
    ;
    Roussel, Philippe  
    Proceedings paper
    2004, Proceedings IEEE International Reliability Physics Symposium - IRPS, 27/04/2004, p.326-332
  • Loading...
    Thumbnail Image
    Publication

    Initial growth mechanism of atomic layer deposited TiN

    Satta, Alessandra
    ;
    Vantomme, Andre  
    ;
    Schuhmacher, Jorg
    ;
    Whelan, Caroline
    ;
    Sutcliffe, Victor
    Journal article
    2004, Applied Physics Letters, (84) 22, p.4571-4573
  • Loading...
    Thumbnail Image
    Publication

    Integration of ALD WCN into a dual damascene oxide module

    Schuhmacher, Jörg
    ;
    Beyer, Gerald  
    ;
    Vos, Ingrid  
    ;
    Sutcliffe, Victor
    ;
    Tokei, Zsolt  
    ;
    Besling, W.
    Proceedings paper
    2003, Proceedings of the Advanced Metallization Conference 2002, 1/10/2002, p.759-765
  • Loading...
    Thumbnail Image
    Publication

    Interface characterization of nanoscale laminate structures on dense dielectric substrates by X-ray reflectivity

    Travaly, Youssef
    ;
    Schuhmacher, Jorg
    ;
    Martin Hoyas, Ana
    ;
    Van Hove, Marleen
    ;
    Maex, Karen  
    Journal article
    2005-04, Journal of Applied Physics, (97) 8, p.84316
  • Loading...
    Thumbnail Image
    Publication

    Interface characterization of nanoscale laminate structures on dense dielectric substrates by x-ray reflectivity

    Travaly, Youssef
    ;
    Schuhmacher, Jorg
    ;
    Martin Hoyas, Ana
    ;
    Van Hove, Marleen
    ;
    Maex, Karen  
    Journal article
    2005-04, Virtual Journal of Nanoscale Science and Technology, (11) 16
  • Loading...
    Thumbnail Image
    Publication

    Opportunities and challenges for integration of ALD barrier layers in damascene process flows

    Sprey, Hessel  
    ;
    Schuhmacher, Jorg
    ;
    Travaly, Youssef
    ;
    Sutcliffe, Victor
    ;
    Abell, Thomas
    Proceedings paper
    2004, Atomic Layer Deposition Conference, 16/08/2004
  • Loading...
    Thumbnail Image
    Publication

    Processing damage and electrical performance of porous dielectrics in narrow spaced interconnects

    Iacopi, Francesca
    ;
    Travaly, Youssef
    ;
    Stucchi, Michele  
    ;
    Struyf, Herbert  
    ;
    Peeters, Stefan  
    Proceedings paper
    2004, Materials, Technology and Reliability for Advanced Interconnects and Low-k Dielectrics, 12/04/2004, p.19-24
  • Loading...
    Thumbnail Image
    Publication

    Sidewall damage and electrical performance of porous dielectrics in narrow spaced interconnects

    Iacopi, Francesca
    ;
    Travaly, Youssef
    ;
    Stucchi, Michele  
    ;
    Struyf, Herbert  
    ;
    Peeters, Stefan  
    Proceedings paper
    2004-05, Materials,Technology, and Reliability of Andvanced Interconnects and Low-K Dielectrics, 11/04/2004, p.F1.5

Follow imec on

VimeoLinkedInFacebook

The repository

  • Contact us
  • Policy
  • About imec
Privacy statement | Cookie settings