Browsing by Author "Sutcliffe, Victor"
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Publication Atomic layer deposited barriers for copper interconnects
Meeting abstract2004, AVS 51 International Symposium, 14/11/2004, p.TF-MoM1Publication Atomic layer deposition of barriers for interconnect
;Besling, Wim ;Satta, Alessandra ;Schuhmacher, Jörg ;Abell, ThomasSutcliffe, VictorProceedings paper2002, Proceedings of the IEEE International Interconnect Technology Conference, 3/06/2002, p.288-291Publication Comprehensive electromigration studies of dual-damascene Cu interconnects with ALD WCxNy barriers
;Bruynseraede, Christophe ;Fisher, A.H. ;Ungar, F. ;Schuhmacher, JorgSutcliffe, VictorProceedings paper2004, Proceedings of the IEEE International Interconnect Technology Conference, 7/06/2004, p.12-14Publication Corrosion and inhibition of WNxCy barrier during chemical mechanical planarization
Journal article2005, Journal of the Electrochemical Society, (152) 12, p.B512-B518Publication Impact of the barrier/dielectric interface quality on reliability of Cu porous-low-k interconnects
Proceedings paper2004, Proceedings IEEE International Reliability Physics Symposium - IRPS, 27/04/2004, p.326-332Publication Initial growth mechanism of atomic layer deposited TiN
Journal article2004, Applied Physics Letters, (84) 22, p.4571-4573Publication Integration of ALD WCN into a dual damascene oxide module
Proceedings paper2003, Proceedings of the Advanced Metallization Conference 2002, 1/10/2002, p.759-765Publication Interface characterization of nanoscale laminate structures on dense dielectric substrates by X-ray reflectivity
Journal article2005-04, Journal of Applied Physics, (97) 8, p.84316Publication Interface characterization of nanoscale laminate structures on dense dielectric substrates by x-ray reflectivity
Journal article2005-04, Virtual Journal of Nanoscale Science and Technology, (11) 16Publication Opportunities and challenges for integration of ALD barrier layers in damascene process flows
Proceedings paper2004, Atomic Layer Deposition Conference, 16/08/2004Publication Processing damage and electrical performance of porous dielectrics in narrow spaced interconnects
Proceedings paper2004, Materials, Technology and Reliability for Advanced Interconnects and Low-k Dielectrics, 12/04/2004, p.19-24Publication Sidewall damage and electrical performance of porous dielectrics in narrow spaced interconnects
Proceedings paper2004-05, Materials,Technology, and Reliability of Andvanced Interconnects and Low-K Dielectrics, 11/04/2004, p.F1.5