Browsing by Author "Sutcliffe, Victor"
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Publication Atomic layer deposited barriers for copper interconnects
Meeting abstract2004, AVS 51 International Symposium, 14/11/2004, p.TF-MoM1Publication Atomic layer deposition of barriers for interconnect
;Besling, Wim ;Satta, Alessandra ;Schuhmacher, Jörg ;Abell, ThomasSutcliffe, VictorProceedings paper2002, Proceedings of the IEEE International Interconnect Technology Conference, 3/06/2002, p.288-291Publication Comprehensive electromigration studies of dual-damascene Cu interconnects with ALD WCxNy barriers
;Bruynseraede, Christophe ;Fisher, A.H. ;Ungar, F. ;Schuhmacher, JorgSutcliffe, VictorProceedings paper2004, Proceedings of the IEEE International Interconnect Technology Conference, 7/06/2004, p.12-14Publication Corrosion and inhibition of WNxCy barrier during chemical mechanical planarization
Journal article2005, Journal of the Electrochemical Society, (152) 12, p.B512-B518Publication Impact of the barrier/dielectric interface quality on reliability of Cu porous-low-k interconnects
Proceedings paper2004, Proceedings IEEE International Reliability Physics Symposium - IRPS, 27/04/2004, p.326-332Publication Initial growth mechanism of atomic layer deposited TiN
Journal article2004, Applied Physics Letters, (84) 22, p.4571-4573Publication Integration of ALD WCN into a dual damascene oxide module
Proceedings paper2003, Proceedings of the Advanced Metallization Conference 2002, 1/10/2002, p.759-765Publication Interface characterization of nanoscale laminate structures on dense dielectric substrates by x-ray reflectivity
Journal article2005, Virtual Journal of Nanoscale Science and Technology, (11) 16Publication Interface characterization of nanoscale laminate structures on dense dielectric substrates by X-ray reflectivity
Journal article2005, Journal of Applied Physics, (97) 8, p.84316Publication Opportunities and challenges for integration of ALD barrier layers in damascene process flows
Proceedings paper2004, Atomic Layer Deposition Conference, 16/08/2004Publication Processing damage and electrical performance of porous dielectrics in narrow spaced interconnects
Proceedings paper2004, Materials, Technology and Reliability for Advanced Interconnects and Low-k Dielectrics, 12/04/2004, p.19-24Publication Sidewall damage and electrical performance of porous dielectrics in narrow spaced interconnects
Proceedings paper2004, Materials,Technology, and Reliability of Andvanced Interconnects and Low-K Dielectrics, 11/04/2004, p.F1.5