Browsing by Author "Tabery, Cyrus"
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Publication Benefits of using advanced sub-resolution features for 0.55NA brightfield imaging
Proceedings paper2024, 2024 International Conference on Extreme Ultraviolet Lithography, 2024-09-29Publication E-TEST validation of EPE budget and metrology
Oral presentation2020, SPIE advanced lithography - Metrology, Inspection, and Process Control for Microlithography XXXIVPublication E-test validation of space error budget and metrology
Journal article2022-06-30, IEEE Transactions on Semiconductor Manufacturing, (35) 3, p.478-484Publication Large area EUV via yield analysis for single damascene process: voltage contrast, CD and defect metrology
Proceedings paper2019, International Conference on Extreme Ultraviolet Lithography 2019, 16/09/2019, p.11147OBPublication Overlay Metrology Performance of Dry Photoresist Towards High NA EUV Lithography
Proceedings paper2024, Conference on Metrology, Inspection, and Process Control XXXVIII, FEB 26-29, 2024, p.Art. 129551RPublication Predictive compact model for stress-induced on-product overlay correction
Journal article2022, JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3, (21) 4, p.Art. 043201Publication Stitching insights towards high numerical aperture extreme ultraviolet lithography: an experimental study
Journal article2025-JAN 1, JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3, (24) 1Publication Validation of imaging benefits of Dual Monopole exposures
Proceedings paper2023, International Conference on Extreme Ultraviolet Lithography, OCT 02-05, 2023, p.Art. 1275006