Browsing by Author "Tanaka, Maki"
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Publication Advanced CD-SEM metrology to improve total process control performance for hyper-NA lithography
Publication Application of model-based library approach to photoresist pattern shape measurement in advenced lithography
Publication Calibration studies of pattern top resist loss detection by CD-SEM for advanced lithography process
Publication Cu Pad Surface Height Evaluation Technique by In-line SEM for Wafer Hybrid Bonding
Publication High-throughput in-line SEM Metrology for Cu Pad Nanotopography for Hybrid Bonding Applications
; ; ; ; ; Proceedings paper2024, 10th IEEE Electronics System-Integration Technology Conference (ESTC), SEP 11-13, 2024Publication In-line SEM Evaluation Technique for Cu Pad Nanotopography for Hybrid Bonding Applications
Proceedings paper2024, 13th IEEE CPMT Symposium Japan, NOV 13-15, 2024, p.92-95Publication MuGFET Observation and CD measurement by using CD-SEM
Publication Performance verification of resist loss measurement method using top-view CD-SEM images for hyper-NA lithography
Proceedings paper2009, Metrology, Inspection, and Process Control for Microlithography XXIII, 23/02/2009, p.727211Publication Study on practical application of pattern top resist loss measurement by CD-SEM for high NA immersion lithography
Publication Validation of CD-SEM etching residue evaluation technique for MuGFET structures
Proceedings paper2009, Metrology, Inspection and Process Control for Microlithography XXIII, 22/02/2009, p.72720QPublication Verification and extension of the MBL technique for photoresist pattern shape measurement