Browsing by Author "Timoshkov, Vadim"
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Publication Co-optimization of lithographic and patterning processes for improved EPE performance
Publication Imaging challenges in 20nm and 14nm logic nodes: hot spots performance in Metal1 layer
Proceedings paper2013, 29th European Mask and Lithography Conference, 25/06/2013, p.88860NPublication Implementing full field EUV lithography using the ADT
; ; ; ; Proceedings paper2008, International Symposium on Extreme Ultraviolet Lithography - EUVL, 28/09/2008Publication Optimum ArFi laser bandwidth for10nm node logic imaging performance
Proceedings paper2015, Optical Microlithography XXVIII, 22/02/2015, p.942609Publication SAQP and EUV block patterning of BEOL metal layers on IMEC's iN7 platform
Proceedings paper2017, Extreme Ultraviolet (EUV) Lithography VIII, 27/02/2017, p.101430HPublication The imec iN7 EUV platform: M2-Block and Via patterning developments
Proceedings paper2016, International Symposium on Extreme Ultraviolet Lithography - EUVL, 24/10/2016