Browsing by Author "Vandervorst, Alain"
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Publication A metal hardmask approach for the contact patterning of a 0.186 μm² SRAM cell exposed with EUV lithography
Meeting abstract2008, American Vacuum Society Fall Meeting, 19/10/2008Publication Implementation of Ru based barriers in 50 nm half pitch single damascene Cu/SiCOH (k=2.5) structures
; ; ; ; Meeting abstract2008, Advanced Metallization Conference - AMC, 23/09/2008Publication Lateral versus interdigitated diode design for 10 Gb/s Low-voltage low-loss silicon ring modulators
Proceedings paper2012, IEEE Optical Interconnects Conference, 20/05/2012, p.TUC 4Publication Metal hard-mask based double patterning for 22nm and beyond
Proceedings paper2010, Advanced Metallization Conference 2009 - AMC 2009, 13/10/2009, p.75-82Publication On the nature of weak spots in high-k layers submitted to anneals
Proceedings paper2004, Integration of Advanced Micro- and Nanoelectronic Devices. Critical Issues and Solutions, 12/04/2004, p.203-208Publication Patterning of 25nm contact holes at 90nm pitch: combination of line/space double exposure immersion lithography and plasma-assisted shrink technology
Journal article2011, Japanese Journal of Applied Physics, (50) 8, p.08JE07Publication The small-gap technique: understanding an ion-shading method for plasma-surface interactions study
Meeting abstract2010, 3rd International Plasma Etch and Strip for Microelectronics Workshop - PESM, 5/03/2010Publication Trends in the oxygen enhancement of the ionisation probabilities of elements sputtered from Si
Oral presentation2002, 3rd European Workshop on Secondary Ion Mass Spectrometry - SIMS Europe