imec Institutional Repository Browsing {{ collection }} by Author "Wolstenholme, J."

Publication

Multitechnique characterisation of Al203 thin layers deposited on SiO2/Si surface by atomic layer chemical vapour deposition

Houssiau, L.

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Vitchev, R.G.

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Pireaux, J.J.

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Conard, Thierry

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Bender, Hugo

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Richard, Olivier

Proceedings paper

2003, AVS 4th International Conference on Microelectronics and Interfaces - ICMI, 3/03/2003, p.36-38

Publication

Physical characterization of mixed HfAlOx layers by complementary analysis techniques

Bender, Hugo

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Conard, Thierry

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Richard, Olivier

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Brijs, Bert

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Petry, Jasmine

Journal article

2004, Materials Science and Engineering B, 109, p.60-63

Publication

Physical characterization of thin HfO2 layers by the combined analysis with complementary techniques

Bender, Hugo

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Conard, Thierry

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Richard, Olivier

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Brijs, Bert

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Petry, Jasmine

Proceedings paper

2003, Analytical Techniques for Semiconductor Materials and Processes, 27/04/2003, p.223-232

Publication

Vacuum UV spectroscopic ellipsometry applied to the characterization of high-k dielectrics

Boher, P.

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Defranoux, C.

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Heinrich, P.

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Wolstenholme, J.

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Bender, Hugo

Oral presentation

2003, E-MRS Spring Meeting Symposium I: Functional Metal Oxides - Semiconductor Structures

Publication

VUV spectroscopic ellipsometry applied to the characterization of high-k dielectrics

Boher, P.

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Defranoux, C.

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Heinrich, P.

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Wolstenholme, J.

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Bender, Hugo

Journal article

2004, Materials Science & Engineering B, (109) 1_3, p.64-68

Publication

X-ray photoelectron spectroscopy characterisation of high-k dielectric Al2O3 and HfO2 layers deposited on SiO2/Si surface

Vitchev, R.G.

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Pireaux, J.J.

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Conard, Thierry

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Bender, Hugo

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Wolstenholme, J.

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Defranoux, C.

Journal article

2004, Applied Surface Science, (235) 1_2, p.21-25

Browsing by Author "Wolstenholme, J."