Browsing by Author "Wood, Obert"
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Publication A method of image-based aberration metrology for EUVL tools
Proceedings paper2015, Extreme Ultraviolet (EUV) Lithography VI, 23/02/2015, p.942215Publication Alternative materials for high numerical aperture extreme ultraviolet lithography mask stacks
Proceedings paper2015, Extreme Ultraviolet (EUV) Lithography VI, 22/02/2015, p.94220IPublication Characterization of telecentricity errors in high-numerical-aperture extreme ultraviolet mask images
Journal article2014, Journal of Vacuum Science and Technology B, (32) 6, p.06F801Publication Driving the industry towards a consensus on high numerical aperture (High-NA) extreme ultraviolet (EUV)
Proceedings paper2014, Extreme Ultraviolet (EUV) Lithography V, 24/02/2014, p.90481OPublication Imaging impact of multilayer tuning in EUV masks, experimental validation
Proceedings paper2014, Photomask Technology 2014, BACUS, 16/09/2014, p.92350JPublication Improved Ru/Si multilayer reflective coatings for advanced extreme-ultraviolet lithography photomasks
Proceedings paper2016, Extreme Ultraviolet (EUV) Lithography, 21/02/2016, p.977619Publication Improving EUV imaging at tighter pitch using a tuned-ML mask stack
Oral presentation2014, International Symposium on EUVLPublication Modeling EUV mask using alternative materials for mask 3D effect compensation
Proceedings paper2015, International Symposium on Extreme Ultraviolet Lithography - EUVL, 5/10/2015Publication Optimized EUV mask absorber stack for improved imaging by reducing roughness and crystallinity of alternative absorber materials
Proceedings paper2016, International Symposium on Extreme Ultraviolet Lithography, 24/10/2016