Browsing by Author "Zhang, J. F."
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Publication A discharge-based multi-pulse technique (DMP) for probing electron trap energy distribution in high-k materials for Flash memory applications
Proceedings paper2009, IEEE International Electron Devices Meeting - IEDM, 7/12/2009, p.139-142Publication A single device based Voltage Step Stress (VSS) technique for fast reliability screening
;Ji, Z. ;Zhang, J. F. ;Zhang, W. D. ;Zhang, X.; ; ; Ren, P.Proceedings paper2014, International Reliability Physics Symposium - IRPS, 1/06/2014, p.GD.2Publication Defect loss: a new concept for reliability of MOSFETs
Journal article2012, IEEE Electron Device Letters, (33) 4, p.480-482Publication Development of a technique for characterizing bias temperature unstability-induced device-to-device variation at SRAM-relevant conditions
Journal article2014, IEEE Transactions on Electron Devices, (61) 9, p.3081-3089Publication Energy distribution of positive charges in Al2O3/GeO2/Ge pMOSFETs
Journal article2014, IEEE Electron Device Letters, (35) 2, p.160-162Publication Energy distribution of positive charges in gate dielectric: probing technique and impacts of different defects
;Hatta, S. W. M. ;Ji, J. ;Zhang, J. F. ;Duan, M. ;Zhang, W. D. ;Soin, N.; Journal article2013, IEEE Transactions on Electron Devices, (60) 5, p.1745-1753Publication Energy distribution of positive charges in high-k dielectric
Journal article2014, Microelectronics Reliability, (54) 9_10, p.2329-2333Publication Hot carrier aging and its variation under use-bias: kinetics, prediction, impact on Vdd and SRAM
;Duan, M. ;Zhang, J. F. ;Manut, A. ;Ji, Z. ;Zhang, W. ;Asenov, A. ;Gerrer, L. ;Reid, D.Razaidi, H.Proceedings paper2015, IEEE International Electron Devices Meeting - IEDM, 7/12/2015, p.547-550Publication Interaction between hot carrier aging and PBTI degradation in nMOSFETs: characterization, modelling and lifetime prediction
;Meng, D. ;Zhang, J. F. ;Zhang, J. C. ;Zhang, W. ;Ji, Z. ;Benbakhti, B. ;Zheng, X. F. ;Hao, Y.Vigar, D.Proceedings paper2017, IEEE International Reliability Physics Symposium - IRPS, 2/04/2017, p.XT-5.1-XT-5.7Publication Interface states beyond band gap and their impact on charge carrier mobility in MOSFETs
Journal article2012, IEEE Transactions on Electron Devices, (59) 3, p.783-790Publication Investigation of preexisting and generated defects in nonfilamentary a-Si/TiO2 RRAM and their impacts on RTN amplitude distribution
;Ma, Jigang ;Chai, Zheng ;Zhang, Wei Dong ;Zhang, J. F. ;Ji, Z. ;Benbakhti, BrahimJournal article2018, IEEE Transactions on Electron Devices, (65) 3, p.970-977Publication Key issues and techniques for characterizing time-dependent device-to-device variation of SRAM
;Duan, M. ;Zhang, J. F. ;Ji, Z. ;Ma, J. G. ;Zhang, W.; ; Proceedings paper2013, International Electron Devices Meeting - IEDM, 9/12/2013, p.774-777Publication Negative bias temperature instability lifetime prediction: problems and solutions
;Ji, Z. ;Hatta, S. F. W. M. ;Zhang, J. F. ;Ma, G. M. ;Zhang, W. ;Soin, N.; Proceedings paper2013, International Electron Devices Meeting - IEDM, 9/12/2013, p.413-416Publication New insights into defect loss, slowdown, and device lifetime enhancement
Journal article2013, IEEE Transactions on Electron Devices, (60) 1, p.413-419Publication New insights into defect loss, slowdown, and device lifetime enhancement
Journal article2013, IEEE Transactions on Electron Devices, (60) 1, p.413-418Publication Real Vth instability of pMOSFETs under practical operation conditions
Proceedings paper2007-12, Technical Digest International Electron Devices Meeting - IEDM, 10/12/2007, p.817-820Publication Time-dependent variation: A new defect-based prediction methodology
;Duan, M. ;Zhang, J. F. ;Ji, Z. ;Zhang, W.; ; ; Proceedings paper2014, IEEE VLSI Technology Symposium, 9/06/2014, p.1-2Publication Understanding charge traps for optimizing Si-passivated Ge nMOSFETs
Proceedings paper2016, IEEE Symposium on VLSI technology, 13/06/2016, p.32-33