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Browsing by Author "Zhang, J. F."

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    A discharge-based multi-pulse technique (DMP) for probing electron trap energy distribution in high-k materials for Flash memory applications

    Zheng, X. F.
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    Zhang, W. .D
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    Govoreanu, Bogdan  
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    Zhang, J. F.
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    Van Houdt, Jan  
    Proceedings paper
    2009, IEEE International Electron Devices Meeting - IEDM, 7/12/2009, p.139-142
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    A single device based Voltage Step Stress (VSS) technique for fast reliability screening

    Ji, Z.
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    Zhang, J. F.
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    Zhang, W. D.
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    Zhang, X.
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    Kaczer, Ben  
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    De Gendt, Stefan  
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    Groeseneken, Guido  
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    Ren, P.
    Proceedings paper
    2014, International Reliability Physics Symposium - IRPS, 1/06/2014, p.GD.2
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    Defect loss: a new concept for reliability of MOSFETs

    Duan, M.
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    Zhang, J. F.
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    Ji, Z.
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    Zhang, W.
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    Kaczer, Ben  
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    De Gendt, Stefan  
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    Groeseneken, Guido  
    Journal article
    2012, IEEE Electron Device Letters, (33) 4, p.480-482
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    Development of a technique for characterizing bias temperature unstability-induced device-to-device variation at SRAM-relevant conditions

    Duan, M.
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    Zhang, J. F.
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    Ji, Z.
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    Zhang, W. D.
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    Kaczer, Ben  
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    Schram, Tom  
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    Ritzenthaler, Romain  
    Journal article
    2014, IEEE Transactions on Electron Devices, (61) 9, p.3081-3089
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    Energy distribution of positive charges in Al2O3/GeO2/Ge pMOSFETs

    Ma, J
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    Zhang, J. F.
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    Ji, Zhigang
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    Benbakhti, Brahim
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    Zhang, Wei
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    Mitard, Jerome  
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    Kaczer, Ben  
    Journal article
    2014, IEEE Electron Device Letters, (35) 2, p.160-162
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    Energy distribution of positive charges in gate dielectric: probing technique and impacts of different defects

    Hatta, S. W. M.
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    Ji, J.
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    Zhang, J. F.
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    Duan, M.
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    Zhang, W. D.
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    Soin, N.
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    Kaczer, Ben  
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    De Gendt, Stefan  
    Journal article
    2013, IEEE Transactions on Electron Devices, (60) 5, p.1745-1753
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    Energy distribution of positive charges in high-k dielectric

    Hatta, S. W. M.
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    Ji, Z.
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    Zhang, J. F.
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    Zhang, W.D.
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    Soin, N.
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    Kaczer, Ben  
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    De Gendt, Stefan  
    Journal article
    2014, Microelectronics Reliability, (54) 9_10, p.2329-2333
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    Hot carrier aging and its variation under use-bias: kinetics, prediction, impact on Vdd and SRAM

    Duan, M.
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    Zhang, J. F.
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    Manut, A.
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    Ji, Z.
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    Zhang, W.
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    Asenov, A.
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    Gerrer, L.
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    Reid, D.
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    Razaidi, H.
    Proceedings paper
    2015, IEEE International Electron Devices Meeting - IEDM, 7/12/2015, p.547-550
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    Interaction between hot carrier aging and PBTI degradation in nMOSFETs: characterization, modelling and lifetime prediction

    Meng, D.
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    Zhang, J. F.
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    Zhang, J. C.
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    Zhang, W.
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    Ji, Z.
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    Benbakhti, B.
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    Zheng, X. F.
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    Hao, Y.
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    Vigar, D.
    Proceedings paper
    2017, IEEE International Reliability Physics Symposium - IRPS, 2/04/2017, p.XT-5.1-XT-5.7
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    Interface states beyond band gap and their impact on charge carrier mobility in MOSFETs

    Ji, Z.
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    Zhang, J. F.
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    Zhang, W. D.
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    Kaczer, Ben  
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    De Gendt, Stefan  
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    Groeseneken, Guido  
    Journal article
    2012, IEEE Transactions on Electron Devices, (59) 3, p.783-790
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    Investigation of preexisting and generated defects in nonfilamentary a-Si/TiO2 RRAM and their impacts on RTN amplitude distribution

    Ma, Jigang
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    Chai, Zheng
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    Zhang, Wei Dong
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    Zhang, J. F.
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    Ji, Z.
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    Benbakhti, Brahim
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    Govoreanu, Bogdan  
    Journal article
    2018, IEEE Transactions on Electron Devices, (65) 3, p.970-977
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    Key issues and techniques for characterizing time-dependent device-to-device variation of SRAM

    Duan, M.
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    Zhang, J. F.
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    Ji, Z.
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    Ma, J. G.
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    Zhang, W.
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    Kaczer, Ben  
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    Schram, Tom  
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    Ritzenthaler, Romain  
    Proceedings paper
    2013, International Electron Devices Meeting - IEDM, 9/12/2013, p.774-777
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    Negative bias temperature instability lifetime prediction: problems and solutions

    Ji, Z.
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    Hatta, S. F. W. M.
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    Zhang, J. F.
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    Ma, G. M.
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    Zhang, W.
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    Soin, N.
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    Kaczer, Ben  
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    De Gendt, Stefan  
    Proceedings paper
    2013, International Electron Devices Meeting - IEDM, 9/12/2013, p.413-416
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    New insights into defect loss, slowdown, and device lifetime enhancement

    Duan, M.
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    Zhang, J. F.
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    Ji, Z.
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    Zhang, W. D.
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    Kaczer, Ben  
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    De Gendt, Stefan  
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    Groeseneken, Guido  
    Journal article
    2013, IEEE Transactions on Electron Devices, (60) 1, p.413-419
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    New insights into defect loss, slowdown, and device lifetime enhancement

    Duan, M.
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    Zhang, J. F.
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    Ji, Z.
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    Zhang, W. D.
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    Kaczer, Ben  
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    De Gendt, Stefan  
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    Groeseneken, Guido  
    Journal article
    2013, IEEE Transactions on Electron Devices, (60) 1, p.413-418
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    Real Vth instability of pMOSFETs under practical operation conditions

    Zhang, J. F.
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    Ji, Z.
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    Chang, M. H.
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    Kaczer, Ben  
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    Groeseneken, Guido  
    Proceedings paper
    2007-12, Technical Digest International Electron Devices Meeting - IEDM, 10/12/2007, p.817-820
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    Time-dependent variation: A new defect-based prediction methodology

    Duan, M.
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    Zhang, J. F.
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    Ji, Z.
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    Zhang, W.
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    Kaczer, Ben  
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    Schram, Tom  
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    Ritzenthaler, Romain  
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    Thean, Aaron  
    Proceedings paper
    2014, IEEE VLSI Technology Symposium, 9/06/2014, p.1-2
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    Understanding charge traps for optimizing Si-passivated Ge nMOSFETs

    Ren, Pengpeng
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    Gao, R.
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    Ji, Zhigang
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    Arimura, Hiroaki  
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    Zhang, J. F.
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    Wang, R.
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    Duan, M.
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    Zhang, W.
    Proceedings paper
    2016, IEEE Symposium on VLSI technology, 13/06/2016, p.32-33

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