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Browsing by Author "van Berkum, J.G.M."

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    Laser annealing for ultra-shallow junction formation in advanced CMOS

    Surdeanu, Radu
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    Ponomarev, Youri
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    Cerutti, R.
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    Pawlak, Bartek  
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    Nanver, L.K.
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    Hoflijk, Ilse  
    Proceedings paper
    2002, Rapid Thermal And Other Short-Time Processing Technologies III, 12/05/2002, p.413-426
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    Local traps as nanoscale reaction-diffusion probes: B clustering in c-Si

    Hantschel, Thomas  
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    Pawlak, B.J.
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    Cowern, N.E.B.
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    Ahn, C.
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    Vandervorst, Wilfried  
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    Gwilliam, R.
    Journal article
    2014, Applied Physics Letters, (105) 22, p.221603
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    Properties of HfTaxOy high-k layers deposited by ALCVD

    Zhao, Chao
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    Rittersma, Z.M.
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    van Berkum, J.G.M.
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    Snijders, J.H.M.
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    Hendriks, A.
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    Breimer, P.
    Proceedings paper
    2005, Advanced Gate Stack, Source/Drain, and Channel Engineering for Si-Based CMOS: New Materials, Processes, and Equipment, 15/05/2005, p.133-140
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    Silicides for advanced CMOS devices

    Lauwers, Anne  
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    Kittl, Jorge
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    Van Dal, Mark  
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    Chamirian, Oxana
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    Kmieciak, Malgorzata
    Proceedings paper
    2005, Microscopy of Semiconducting Materials. Proceedings of the 14th Conference, 11/04/2005, p.379-388
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    Tantalum-based gate electrode metals for advanced CMOS devices

    Hooker, Jacob
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    Lander, Rob
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    Cubaynes, Florence
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    Schram, Tom  
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    Roozeboom, F.
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    van Zijl, J.
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    Maas, M.
    Proceedings paper
    2005, Advanced Gate Stack, Source/Drain, and Channel Engineering for Si-Based CMOS: New Materials, Processes, and Equipment, 15/05/2005, p.215-224
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    The relation between phase formation and onset of thermal degradation in nano-scale CoSi2-polycrystalline silicon structures

    Van Dal, Mark  
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    Jawarani, D.
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    van Berkum, J.G.M.
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    Kaiser, M.
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    Kittl, Jorge
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    Vrancken, Christa  
    Journal article
    2004-12, Journal of Applied Physics, (96) 12, p.7568-7573

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