Browsing by Author "van Wingerden, Johannes"
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Publication Bottom-ARC optimization methodology for 0.25μm lithography and beyond
Proceedings paper1998, Optical Microlithography XI, 25/02/1998, p.322-336Publication Comparisons of 9% versus 6% transmission attenuated phase shift mask for the 65nm device node
Publication Comparisons of 9% versus 6% transmission attenuated phase-shift mask for the 65nm device mode
Publication Process, design and optical proximity correction requirements for the 65nm device generation
Publication SPM characterizaton of anomalies in phase shift mask and their effect on wafer features
Proceedings paper2001, Metrology, Inspection, and Process Control for Microlithography XV, 26/02/2001, p.188-199