Browsing by author "Verdonck, Patrick"
Now showing items 101-120 of 153
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Nucleation behaviour of PEALD WS2 on Al2O3 and SiO2
Groven, Benjamin; Nalin Mehta, Ankit; Meersschaut, Johan; Vanhaeren, Danielle; Bender, Hugo; Verdonck, Patrick; Van Elshocht, Sven; Radu, Iuliana; Caymax, Matty; Delabie, Annelies (2016) -
Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates
Groven, Benjamin; Nalin Mehta, Ankit; Bender, Hugo; Smets, Quentin; Meersschaut, Johan; Franquet, Alexis; Conard, Thierry; Nuytten, Thomas; Verdonck, Patrick; Vandervorst, Wilfried; Heyns, Marc; Radu, Iuliana; Caymax, Matty; Delabie, Annelies (2018) -
Optimization of low-k UV curing: effect of wavelength on critical properties of the dielectric
Aksenov, German; De Roest, David; Verdonck, Patrick; Dultsev, F.N.; Marsik, Prema; Shamiryan, Denis; Arai, H; Takamura, N.; Baklanov, Mikhaïl (2009) -
Opto-acousto-optic evaluation of the physical properties of nanoporous materials
Mechri, C.; Ruello, P.; Mounier, D.; Breteau, J.M.; Edely, M.; Minhao, Y.; Gibaud, A.; Povey, I.; Pemble, M.; Romanov, S.G.; Baklanov, Mikhaïl; Verdonck, Patrick; Gusev, V. (2008) -
Performance optimization of semiconductor manufacturing equipment by the application of discrete event simulation
Pfeffer, Markus; Oechsner, Richard; Pfitzner, Lothar; Ryssel, Heiner; Ocker, Berthold; Verdonck, Patrick (2008) -
Phase-shift photomask designed by scalar diffractiontheory
Cirino, Giuseppe; Mansano, Ronaldo; Verdonck, Patrick; Cescato, Lucila; Marega, E.; Goncalves Neto, Luiz (2009-09) -
Physical characterization of hafnium aluminates dielectrics deposited by atomic layer deposition
Huanca, Danilo R.; Christiano, V.; Adelmann, Christoph; Verdonck, Patrick; Dos Santos Filho, Sebastio G. (2015-09) -
Physical characterization of high-k HfxAl1-xOy gate dielectrics prepared by ALD
Christiano, Verônica; Adelmann, Christoph; Kellermann, Guinther; Verdonck, Patrick; Dos Santos Filho, Sebastio G. (2011) -
Plasma damage and restoration of a spin-on organic ultra low-k material (k=2.3)
Lukaszewicz, Mikolaj; de Marneffe, Jean-Francois; Wilson, Chris; Zhang, Liping; Peng, Hsing-Ying; Verdonck, Patrick; Baklanov, Mikhaïl (2012) -
Plasma Enhanced Atomic Layer Deposition of Two-Dimensional WS2 from WF6, H2S and H2 plasma
Groven, Benjamin; Heyne, Markus; Meersschaut, Johan; Nuytten, Thomas; Bender, Hugo; Richard, Olivier; Conard, Thierry; Verdonck, Patrick; Van Elshocht, Sven; Heyns, Marc; Radu, Iuliana; Caymax, Matty; Delabie, Annelies (2016) -
Plasma enhanced atomic layer deposition of two-dimensional WS2 from WF6, H2S and H2 plasma precursors
Groven, Benjamin; Heyne, Markus; Haesevoets, Karel; Meersschaut, Johan; Nuytten, Thomas; Conard, Thierry; Verdonck, Patrick; Van Elshocht, Sven; Heyns, Marc; Radu, Iuliana; Delabie, Annelies; Caymax, Matty (2015) -
Plasma parameters obtained with planar probe and optical emission spectroscopy
Daltrini, Andre; Moshkalev, Stanislas; Swart, Laura; Verdonck, Patrick (2007) -
Plasma-enhanced atomic layer seposition of two-dimensional WS2 from WF6, H2 plasma, and H2S
Groven, Benjamin; Heyne, Markus; Nalin Mehta, Ankit; Bender, Hugo; Nuytten, Thomas; Meersschaut, Johan; Conard, Thierry; Verdonck, Patrick; Van Elshocht, Sven; Vandervorst, Wilfried; De Gendt, Stefan; Heyns, Marc; Radu, Iuliana; Caymax, Matty; Delabie, Annelies (2017) -
Plasma-induced damage reduction in porous SiOCH dielectrics by replacement of H2 and N2 by CH2F2 and Ar in fluorocarbon based plasmas
Souriau, Laurent; Lazzarino, Frederic; Carbonell, Laure; Ciofi, Ivan; Verdonck, Patrick; de Marneffe, Jean-Francois; Baklanov, Mikhaïl (2011) -
Pore sealing of k 2.0 dielectrics assisted by self-assembled monolayers deposited from vapor phase
Armini, Silvia; Loyo Prado, Jana; Krishtab, Mikhail; Swerts, Johan; Verdonck, Patrick; Meersschaut, Johan; Conard, Thierry; Blauw, Michiel; Struyf, Herbert; Baklanov, Mikhaïl (2014) -
Pore sealing of porous low-k films by SAMs for ALD
Armini, Silvia; Verdonck, Patrick; Loyo Prado, Jana; Krishtab, Mikhail; Swerts, Johan; Ciofi, Ivan; Meerschaut, Johan; Kim, Tae-Gon; Adelmann, Christoph; Le Quoc, Toan; Van Elshocht, Sven; Delabie, Annelies; Leunissen, Peter; Baklanov, Mikhaïl (2011) -
Pore sealing of porous ultralow-k dielectrics by self-assembled monolayers combined with atomic layer deposition
Armini, Silvia; Loyo Prado, Jana; Swerts, Johan; Sun, Yiting; Krishtab, Mikhail; Meersschaut, Johan; Blauw, Michiel; Baklanov, Mikhaïl; Verdonck, Patrick (2012) -
Porogen residue free ultra low-k PECVD material: fabrication, optical and mechanical properties
Urbanowicz, Adam; Vanstreels, Kris; Verdonck, Patrick; Cremel, Maxime; De Gendt, Stefan; Baklanov, Mikhaïl (2009) -
Porogen residues detection in optical properties of low-k dielectrics cured by ultraviolet radiation
Marsik, P.; Verdonck, Patrick; De Roest, David; Baklanov, Mikhaïl (2010) -
Process Integration of High Aspect Ratio Vias with a Comparison between Co and Ru Metallizations
Vega Gonzalez, Victor; Montero Alvarez, Daniel; Versluijs, Janko; Varela Pedreira, Olalla; Jourdan, Nicolas; Puliyalil, Harinarayanan; Chehab, Bilal; Peissker, Tobias; Haider, Ali; Batuk, Dmitry; Martinez Alanis, Gerardo Tadeo; Geypen, Jef; Le, Quoc Toan; Bazzazian, Nina; Heylen, Nancy; van der Veen, Marleen; El-Mekki, Zaid; Webers, Tomas; Vats, H.; Rynders, Luc; Cupak, Miroslav; Lee, Jae Uk; Drissi, Youssef; Halipre, Luc; Gillijns, Werner; Charley, Anne-Laure; Verdonck, Patrick; Witters, Thomas; Van Gompel, Sander; Kimura, Yosuke; Ciofi, Ivan; De Wachter, Bart; Swerts, Johan; Grieten, Eva; Ercken, Monique; Kim, Ryan Ryoung han; Croes, Kristof; Leray, Philippe; Jaysankar, Manoj; Nagesh, Nishanth; Ramakers, Leon; Murdoch, Gayle; Park, Seongho; Tokei, Zsolt; Dentoni Litta, Eugenio; Horiguchi, Naoto (2021)