Browsing by author "Sonnemans, Roger"
Now showing items 1-10 of 10
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Lossless solvent-based extension implant strip
Vos, Rita; Mannaert, Geert; Halder, Sandip; Wada, Masayuki; Sonnemans, Roger; Tsvetanova, Diana; Valckx, Nick; Vanstreels, Kris; Conard, Thierry; Mertens, Paul (2009) -
Lossless solvent-based extension implant strip
Vos, Rita; Mannaert, Geert; Halder, Sandip; Wada, Masayuki; Sonnemans, Roger; Tsvetanova, Diana; Valckx, Nick; Vanstreels, Kris; Conard, Thierry; Mertens, Paul (2009) -
Metrology for implanted Si substrate and dopant loss studies
Radisic, Dunja; Shamiryan, Denis; Mannaert, Geert; Boullart, Werner; Rosseel, Erik; Bogdanowicz, Janusz; Goossens, Jozefien; Marrant, Koen; Bender, Hugo; Sonnemans, Roger; Berry, Ivan (2009) -
Metrology for implanted Si substrate loss studies
Radisic, Dunja; Shamiryan, Denis; Mannaert, Geert; Boullart, Werner; Rosseel, Erik; Bogdanowicz, Janusz; Goossens, Jozefien; Marrant, Koen; Bender, Hugo; Sonnemans, Roger; Berry, Ivan (2010) -
Non-oxidizing solvent-based strip of ion implanted photoresist
Tsvetanova, Diana; Vos, Rita; Vanstreels, Kris; Radisic, Dunja; Sonnemans, Roger; Berry, Ivan; Waldfried, Carlo; Mattson, David; DeLuca, J; Vereecke, Guy; Mertens, Paul; Parac-Vogt, Tatjana; Heyns, Marc (2012) -
Non-oxidizing solvent-based strip of ion implanted photoresist
Tsvetanova, Diana; Vos, Rita; Vanstreels, Kris; Sonnemans, Roger; Berry, Ivan; Waldfried, Carlo; Mattson, David; DeLuca, J; Vereecke, Guy; Mertens, Paul; Parac-Vogt, Tatjana; Heyns, Marc (2010) -
Optimization of post ion implant ash plasma and clean for ultra shallow extension/halo implantation
Mannaert, Geert; Schram, Tom; Ortolland, Claude; Demand, Marc; Sonnemans, Roger; Berry, Ivan (2011) -
Post extension ion implant photo resist strip for 32 nm technology and beyond
Mannaert, Geert; Witters, Liesbeth; Shamiryan, Denis; Boullart, Werner; Han, Keping; Luo, Shiian; Falepin, Annelies; Sonnemans, Roger; Berry, Ivan; Waldfried, Carlo (2008) -
Removal of high-dose ion-implanted 248nm deep UV photoresist using UV irradiation and organic solvent
Tsvetanova, Diana; Vos, Rita; Vanstreels, Kris; Radisic, Dunja; Sonnemans, Roger; Berry, Ivan; Waldfried, Carlo; Mattson, David; DeLuca, James; Vereecke, Guy; Mertens, Paul; Parac-Vogt, Tatjana; Heyns, Marc (2011) -
Using the background signal of a light scattering tool for I/I photo resist strip optimization and monitoring
Halder, Sandip; Vos, Rita; Wada, Masayuki; Claes, Martine; Kenis, Karine; Mertens, Paul; Dighe, Prasanna; Radovanovic, Sanda; Simpson, Gavin; Sonnemans, Roger (2010)