Browsing by author "Frommhold, Andreas"
Now showing items 1-12 of 12
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Elucidating the role of imaging metrics for variability and after etch defectivity
Franke, Joern-Holger; Frommhold, Andreas; Dauendorffer, Arnaud; Nafus, Kathleen; Rispens, Gijsbert; Maslow, Mark (2022) -
Enabling Non-Actinic EUV Mask Inspection using CNT Pellicle
Keshet, Mor; Gershon, Dor; Malul, Uriel; Blinder, Yaniv; Orr, Yonatan; Tam, Aviram; Santoro, Gaetano; Houchens, Kevin; Gallagher, Emily; Timmermans, Marina; Frommhold, Andreas; Lorusso, Gian (2021) -
Evaluation of local CD and placement distribution on EUV mask and its impact on wafer
Vaenkatesan, Vidya; Van Adrichem, Paul; Kooiman, Marleen; Kubis, Michael; Van Look, Lieve; Frommhold, Andreas; Gallagher, Emily; Nam, DS; Mulkens, Jan; Finders, Jo; Rispens, Gijsbert (2019) -
Extending EUV lithography for DRAM applications
Rispens, Gijsbert; Van Lare, C.; Oorschot, D.; Hoefnagels, R.; Liu, S.; Van Mierlo, W.; Zuurbier, N.; Dardani, Z.; Wang, Z.; Maslow, M.; Finders, J.; Fallica, Roberto; Frommhold, Andreas; Hendrickx, Eric; Niroomand, A.; Light, S. (2020) -
Fundamental understanding and experimental verification of bright versus dark field imaging
Davydova, Natalia; Finders, Jo; van Lare, Claire; McNamara, John; Van Setten, Eelco; Zekry, Joseph; Fliervoet, Timon; Carpaij, Rene; Franke, Joern-Holger; Frommhold, Andreas; Verch, Andreas; Kersteen, Grizelda; Capelli, Renzo (2020) -
Impact of local variability on defect-aware process windows
Maslow, Mark John; Yaegashi, Hidetami; Frommhold, Andreas; Schiffelers, Guido; Wahlisch, Felix; Rispens, Gijsbert; Slachter, Bram; Yoshida, Keisuke; Hara, Arisa; Oikawa, Noriaki; Pathak, Abhinav; Cerbu, Dorin; Hendrickx, Eric; Bekaert, Joost (2019) -
Massive e-beam metrology and inspection for analysis of EUV stochastic defect
Kang, Seulki; Maruyama, K.; Yamazaki, Z.; De Simone, Danilo; Rincon Delgadillo, Paulina; Frommhold, Andreas; Lorusso, Gian; Das, Sayantan; Halder, Sandip; Leray, Philippe (2021) -
Metal layer single EUV expose at pitch 28nm: how bright field and NTD resist advantages align
Franke, Joern-Holger; Frommhold, Andreas; Davydova, Natalia; Aubert, Remko; Nair, Vineet Vijayakrishnan; Kovalevich, Tatiana; Rio, David; Bekaert, Joost; Wang, Erik; Rispens, Gijsbert; Maslow, Mark; Hendrickx, Eric (2021) -
Optimization and stability of CD variability in pitch 40 nm contact holes on NXE:3300
Van Look, Lieve; Bekaert, Joost; Frommhold, Andreas; Hendrickx, Eric; Rispens, Gijsbert; Schiffelers, Guido (2018) -
Pupil optimization for after etch defectivity: what imaging metrics matter?
Frommhold, Andreas; Franke, Joern-Holger; Maslow, Mark J.; Nafus, Kathleen; Rispens, Gijsbert (2021) -
Roughness decomposition: an on-wafer methodology to discriminate mask, metrology, and shot noise contributions
Lorusso, Gian; Rispens, Gijsbert; Rutigliani, Vito; Van Roey, Frieda; Frommhold, Andreas; Schiffelers, Guido (2019) -
Understanding the significance of local variability in defect-aware process windows
Maslow, Mark John; Yaegashi, Hidetami; Frommhold, Andreas; Hara, Arisa; Cerbu, Dorin (2020)