Browsing by author "Yen, Anthony"
Now showing items 1-11 of 11
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248 nm lithography for the 0.18 μm generation
Vandenberghe, Geert; Tzviatkov, Plamen; Yen, Anthony; Ronse, Kurt; Van den hove, Luc; Luehrmann, P.; Slonaker, S.; van Ingen Schenau, K.; Juffermans, Casper (1996) -
Characterization and correction of optical proximity effects in deep-ultraviolet lithography using behavior modeling
Yen, Anthony; Tritchkov, Alexander; Stirniman, J. P.; Vandenberghe, Geert; Jonckheere, Rik; Ronse, Kurt; Van den hove, Luc (1996) -
Characterization and optimization of CD control for 0.25µm CMOS applications
Ronse, Kurt; Op de Beeck, Maaike; Yen, Anthony; Kim, Kee - Ho; Van den hove, Luc (1996) -
Feasability demonstration of 0.18 µm and 0.13 µm optical projection lithography based on CD control calculations
Kim, Kee - Ho; Ronse, Kurt; Yen, Anthony; Van den hove, Luc (1996) -
Feature biasing versus feature-assisted lithography. A comparison of proximity correction methods for 0.5*(l/NA) lithography
Pforr, Rainer; Wong, Alfred; Ronse, Kurt; Van den hove, Luc; Yen, Anthony; Palmer, S.; Fuller, G.; Otto, O. (1995) -
Optical proximity correction for 0.3 μm i-line lithography
Yen, Anthony; Tzviatkov, Plamen; Wong, Alfred; Juffermans, Casper; Jonckheere, Rik; Jaenen, Patrick; Garofalo, J.; Otto, O.; Ronse, Kurt; Van den hove, Luc (1996) -
Optical proximity correction: mask pattern-generation challenges
Jonckheere, Rik; Wong, Alfred; Yen, Anthony; Ronse, Kurt; Van den hove, Luc (1996) -
Optical proximity effects and correction strategies for chemical amplified DUV resists
Op de Beeck, Maaike; Bruggeman, Albert; Botermans, Harry; Van Driessche, Veerle; Yen, Anthony; Tritchkov, Alexander; Jonckheere, Rik; Ronse, Kurt; Van den hove, Luc (1996) -
Optical proximity effects correction at 0.25 mm incorporating process variations in lithography
Tritchkov, Alexander; Rieger, M.; Stirniman, J.; Yen, Anthony; Ronse, Kurt; Vandenberghe, Geert; Van den hove, Luc (1997) -
Optically enhanced i-line lithography for 0.3-μm random logic applications
Yen, Anthony; Tzviatkov, Plamen; Grozev, Grozdan (1996) -
Top-surface imaging and optical proximity correction: a way to 0.18 µm lithography at 248 nm
Goethals, Mieke; Vertommen, Johan; Van Roey, Frieda; Yen, Anthony; Tritchkov, Alexander; Ronse, Kurt; Jonckheere, Rik; Van den hove, Luc (1996)