Browsing by author "Melvin, Lawrence, III"
Now showing items 1-8 of 8
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Calibrated Modeling of Line-to-Line Dielectric Reliability: LER Specs to Meet Reliability Constraints at Operating Conditions
Ciofi, Ivan; Roussel, Philippe; Saad, Yves; Melvin, Lawrence; Wilson, Chris; Croes, Kristof (2019) -
Contribution of mask roughness in stochasticity of high-NA EUV imaging
Jonckheere, Rik; Melvin, Lawrence, III (2021-11) -
Does high-NA EUV require tighter mask roughness specifications: a simulation study
Jonckheere, Rik; Melvin, Lawrence, III (2022) -
Double patterning at NA 0.33 versus high-NA single exposure in EUV lithography: an imaging comparison
Gao, Weimin; Wiaux, Vincent; Hoppe, Wolfgang; Philipsen, Vicky; Melvin, Lawrence; Hendrickx, Eric; Lucas, Kevin; Kim, Ryan Ryoung han (2018) -
Exploration of etch step interactions in the dual patterning process for process modeling
Melvin, Lawrence; Ward, Brian; Song, H.; Rhie, S.U.; Lucas, K.D.; Wiaux, Vincent; Verhaegen, Staf; Maenhoudt, Mireille (2008) -
Flare mitigation strategies in extreme ultraviolet lithography
Kim, Insung; Myers, Alan; Melvin, Lawrence; Ward, Brian; Lorusso, Gian; Jonckheere, Rik; Goethals, Mieke; Ronse, Kurt (2008) -
Modeling EUVL patterning variability for metal layers in 5nm technology node and its effect on electrical resistance
Gao, Weimin; Blanco, Victor; Philipsen, Vicky; Kamohara, Itaru; Saad, Yves; Ciofi, Ivan; Melvin, Lawrence; Hendrickx, Eric; Wiaux, Vincent; Kim, Ryan Ryoung han (2017) -
Stochastic printing behavior of ML-defects on EUV mask
Jonckheere, Rik; Melvin, Lawrence; Capelli, Renzo (2019-09)