Browsing by author "Hansen, Terje"
Now showing items 1-9 of 9
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Challenges for smoothing EUV photoresist line-width-roughness: plasma treatment from 40 to 22 nm half pitches
Altamirano Sanchez, Efrain; De Schepper, Peter; Hansen, Terje; Boullart, Werner (2013) -
Line edge and width roughness mitigation at 22nm half pitch: plasma polymer interaction and roughness mitigation through etch
De Schepper, Peter; Hansen, Terje; Vaglio Pret, Alessandro; Altamirano Sanchez, Efrain; Boullart, Werner; De Gendt, Stefan (2013) -
Line edge and width roughness smoothing by plasma treatment
De Schepper, Peter; Hansen, Terje; Altamirano Sanchez, Efrain; Vaglio Pret, Alessandro; Boullart, Werner; De Gendt, Stefan (2013) -
Line edge and width roughness smoothing by plasma treatment
De Schepper, Peter; Hansen, Terje; Altamirano Sanchez, Efrain; Vaglio Pret, Alessandro; El Otell, Ziad; Boullart, Werner; De Gendt, Stefan (2014) -
Pattern roughness mitigation of 22 nm lines and spaces: The impact of H2 plasma treatment
De Schepper, Peter; Vaglio Pret, Alessandro; El Otell, Ziad; Hansen, Terje; Altamirano Sanchez, Efrain; De Gendt, Stefan (2015) -
Plasma influence on the attenuation of line width roughness of EUV photoresist lines ranging from 40 to 22 nm half pitch
Altamirano Sanchez, Efrain; De Schepper, Peter; Hansen, Terje; Boullart, Werner (2013) -
The influence of the initial LWR, CD and EUV-resist composition on LWR reduction by H2 plasma treatment
De Schepper, Peter; Altamirano Sanchez, Efrain; Hansen, Terje; Boullart, Werner; De Gendt, Stefan (2014) -
Vacuum ultra-violet emission of CF4 & CF3I containing plasmas and their effect on low-k materials
El Otell, Ziad; Samara, Vladimir; Zotovich, Alexey; Hansen, Terje; de Marneffe, Jean-Francois; Baklanov, Mikhaïl (2015) -
XAS photoresists electron/quantum yields study with synchrotron light
De Schepper, Peter; Vaglio Pret, Alessandro; Hansen, Terje; Giglia, Angelo; Hoshiko, Kenji; Mani, Antonio; Biafore, John J. (2015)