Browsing by author "Pforr, Rainer"
Now showing items 1-8 of 8
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Attenuated phase shifting masks in combination with off-axis illumination: A way towards quarter micron DUV lithography for random logic operations
Ronse, Kurt; Pforr, Rainer; Baik, Ki-Ho; Jonckheere, Rik; Van den hove, Luc (1994) -
CD Control: The limiting factor for i-line and deep-UV lithography?
Ronse, Kurt; Pforr, Rainer; Op de Beeck, Maaike; Van den hove, Luc (1995) -
Evaluation of advanced I-line resists for practical 0.5*(l/NA) lithography
Tzviatkov, Plamen; Pforr, Rainer; Jaenen, Patrick; Vertommen, Johan; Van den hove, Luc (1994) -
Extending the Limits of Optical Lithography for Arbitrary Mask Layouts Using Attenuated Phase Shifting Masks with Optimized Illumination
Ronse, Kurt; Pforr, Rainer; Baik, Ki-Ho; Jonckheere, Rik; Van den hove, Luc (1994) -
Feature biasing versus feature-assisted lithography. A comparison of proximity correction methods for 0.5*(l/NA) lithography
Pforr, Rainer; Wong, Alfred; Ronse, Kurt; Van den hove, Luc; Yen, Anthony; Palmer, S.; Fuller, G.; Otto, O. (1995) -
Improvement of the focus-exposure latitude using optimised illumination and mask design
Pforr, Rainer; Ronse, Kurt; Jaenen, Patrick; Jonckheere, Rik; Van den hove, Luc; van Oorschot, P.; Luehrman, P. (1994) -
Optical lithography techniques for 0.25 μm and below: CD control issues
Van den hove, Luc; Ronse, Kurt; Pforr, Rainer (1995) -
Optimization of the optical phase shift in attenuated PSM and application to quarter micron deep-UV lithography for logics
Ronse, Kurt; Pforr, Rainer; Baik, Ki-Ho; Jonckheere, Rik; Van den hove, Luc (1994)