Browsing by author "Ponomarev, Youri"
Now showing items 1-12 of 12
-
A manufacturable 25nm planar MOSFET technology
Ponomarev, Youri; Loo, Josine; Dachs, Charles; Cubaynes, Florence; Verheijen, M. A.; Kaiser, M.; van Berkum, J. G. M.; Kubicek, Stefan; Bolk, J.; Rovers, Madelon (2001) -
A practical baseline process for advanced CMOS devices research
Ponomarev, Youri; Loo, Josine; Rittersma, Chris; Lander, Rob; Hooker, Jacob; Doornbos, Gerben; Surdeanu, Radu; Cubaynes, Florence; Dachs, Charles; Kubicek, Stefan; Henson, Kirklen; Lindsay, Richard (2003) -
Advanced PMOS device architecture for highly-doped ultra-shallow junctions
Surdeanu, Radu; Pawlak, Bartek; Lindsay, Richard; Van Dal, Mark; Doornbos, Gerben; Dachs, C.J.J.; Ponomarev, Youri; Loo, Josine; Cubaynes, Florence; Henson, Kirklen; Verheijen, M.A.; Kaiser, M.; Pagès, Xavier; Stolk, Peter; Jurczak, Gosia (2004) -
Characterization of thermal and electrical stability of MOCVD HfO2-HfSiO4 dielectric layers with polysilicon electrodes for advanced CMOS technologies
Rittersma, Chris; Loo, Josine; Ponomarev, Youri; Verheijen, M.A.; Kaiser, M.; Roozeboom, F.; Van Elshocht, Sven; Caymax, Matty (2004) -
CMOS device optimisation for mixed-signal technologies
Stolk, Peter; Tuinhout, Hans; Duffy, Ray; Augendre, Emmanuel; Bellefroid, L. P.; Bolt, M. J. B.; Croon, Jeroen; Dachs, Charles; Huisman, F. R. J.; Moonen, A. J.; Ponomarev, Youri; Roes, R. F. M.; Da Rold, Martina; Seevinck, E.; Sreerambhatla, K. N.; Surdeanu, Radu; Velghe, Rudolf; Vertregt, M.; Webster, M. N.; van Winkelhoff, N. K. J.; Zegers-Van Duijnhoven, A. T. A. (2001) -
CMOS scaling beyond the 90 nm CMOS technology node: shallow junction and integration challenges
Dachs, Charles; Surdeanu, Radu; Pawlak, Bartek; Doornbos, Gerben; Duffy, R.; Heringa, Anco; Ponomarev, Youri; Venezia, Vincent; Van Dal, Mark; Stolk, P.; Lindsay, Richard; Henson, Kirklen; Dieu, B.; Geenen, Luc; Hoflijk, Ilse; Richard, Olivier; Clarysse, Trudo; Brijs, Bert; Vandervorst, Wilfried; Pagès, Xavier (2003) -
Drift mobile and Hall scattering factors of holes in ultrathin Si1-xGex layers (0.3<x<0.4) grown on Si
Lander, Rob; Ponomarev, Youri; van Berkum, J. G. M.; de Boer, W. B.; Loo, Roger; Caymax, Matty (2000) -
Electrical properties of MOCVD HfO2 dielectric layers with polysilicon gate electrodes for CMOS applications
Date, Lucien; Rittersma, Chris; Massoubre, D.; Ponomarev, Youri; Roozeboom, F.; Pique, Didier; Van Autryve, Luc; Van Elshocht, Sven; Caymax, Matty (2003) -
Impact of channel engineering technology on HC performance of 100 nm MOSFETs
Okhonin, S.; Fazan, P.; Kubicek, Stefan; Henson, Kirklen; De Meyer, Kristin; Ponomarev, Youri (2001) -
Laser annealing for ultra-shallow junction formation in advanced CMOS
Surdeanu, Radu; Ponomarev, Youri; Cerutti, R.; Pawlak, Bartek; Nanver, L.K.; Hoflijk, Ilse; Stolk, Peter; Dachs, Charles; Verheijen, M.A.; Kaiser, M.; Hopstaken, M.J.P.; van Berkum, J.G.M.; Roozeboom, F.; Lindsay, Richard (2002) -
Measurement of hole transport in ultrathin SiGe layers and their application in 2D device simulations of heterojunction pMOSFETs
Lander, Rob; Ponomarev, Youri; de Boer, W. B.; Loo, Roger; Caymax, Matty (2000) -
Pre-amorphization and co-implantation suitability for advanced PMOS devices integration
Surdeanu, Radu; Pawlak, Bartek; Lindsay, Richard; Van Dal, Mark; Doornbos, Gerben; Dachs, Charles; Ponomarev, Youri; Loo, Josine; Henson, Kirklen; Verheijen, M.; Kaiser, M.; Pagès, Xavier; Jurczak, Gosia; Stolk, Peter (2003)