Browsing by author "Van Doorne, Patrick"
Now showing items 1-13 of 13
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Alternative post-etch polymer removal in a single-wafer platform
Dundas, C.; Vroom, R.; Ghekiere, John; Van Doorne, Patrick; Rink, I.; Sharp, I.; Heffernan, S. (2003) -
Analysis of trace metals in thin silicon nitride films by total-reflection X-ray fluorescence
Vereecke, Guy; Arnauts, Sophia; Van Doorne, Patrick; Kenis, Karine; Onsia, Bart; Verstraeten, K.; Schaekers, Marc; Van Hoeymissen, Jan; Heyns, Marc (2001) -
Damage-free removal of nano-sized particles, heading towards a red brick wall
Mertens, Paul; Fyen, Wim; Vereecke, Guy; Xu, Kaidong; Lauerhaas, J.; Holsteyns, Frank; Van Doorne, Patrick; Kesters, Els; Vos, Rita (2003) -
Developments in cleaning technology for critical layers
Heyns, Marc; Arnauts, Sophia; Bearda, Twan; Claes, M.; Cornelissen, Ingrid; De Gendt, Stefan; Doumen, Geert; Fyen, Wim; Loewenstein, Lee; Lux, Marcel; Mertens, Paul; Mertens, S.; Meuris, Marc; Onsia, Bart; Röhr, Erika; Schaekers, Marc; Teerlinck, Ivo; Van Doorne, Patrick; Van Hoeymissen, Jan; Vereecke, Guy; Vos, Rita; Wolke, K. (2000) -
Effective post-etch residue removal on low-K films using single wafer processing
Kesters, Els; Ghekiere, John; Van Doorne, Patrick; Vereecke, Guy; Mertens, Paul; Heyns, Marc (2004) -
Effective post-etch residue removal on low-k films using single wafer processing
Kesters, Els; Ghekiere, John; Van Doorne, Patrick; Vereecke, Guy; Mertens, Paul; Heyns, Marc (2003) -
Etching and cleaning of HfO2 deposited on Si
Snow, Jim; Kraus, Harald; Van Doorne, Patrick; Mertens, Paul; Kovacs, Fredi (2002-11) -
Etching of HfO2, deposited on LPCVD Si3N4, and cleaning of Hf residues
Kraus, Harald; Snow, Jim; Van Doorne, Patrick; Mertens, Paul; Kovacs, F. (2003) -
Integration of high-k gate dielectrics - wet etch, cleaning and surface conditioning
De Gendt, Stefan; Beckx, Stephan; Caymax, Matty; Claes, Martine; Conard, Thierry; Delabie, Annelies; Deweerd, Wim; Kraus, Harald; Onsia, Bart; Paraschiv, Vasile; Puurunen, Riikka; Röhr, Erika; Snow, Jim; Tsai, Wilman; Van Doorne, Patrick; Van Elshocht, Sven; Vertommen, Johan; Witters, Thomas; Heyns, Marc (2003) -
Integration of high-K gate dielectrics - wet etch, cleaning and surface conditioning
De Gendt, Stefan; Beckx, Stephan; Caymax, Matty; Claes, Martine; Conard, Thierry; Delabie, Annelies; Deweerd, Wim; Hellin, David; Kraus, Harald; Onsia, Bart; Paraschiv, Vasile; Puurunen, Riikka; Rohr, Erika; Snow, Jim; Tsai, Wilman; Van Doorne, Patrick; Van Elshocht, Sven; Vertommen, Johan; Witters, Thomas; Heyns, Marc (2004) -
Method for determining the effectiveness of silicon nitride as a barrier layer for HfO2
Kraus, Harald; Snow, Jim; Van Doorne, Patrick; Fyen, Wim; Mertens, Paul; Kovacs, Frederic (2004) -
Method for determining the effectiveness of silicon nitride as a barrier layer for HfO2
Kraus, Harald; Snow, Jim; Van Doorne, Patrick; Mertens, Paul; Kovacs, Frederic (2003) -
Scaling of high-k dielectrics towards sub-1nm EOT
Heyns, Marc; Beckx, Stephan; Bender, Hugo; Blomme, Pieter; Boullart, Werner; Brijs, Bert; Carter, Richard; Caymax, Matty; Claes, Martine; Conard, Thierry; De Gendt, Stefan; Degraeve, Robin; Delabie, Annelies; Deweerd, Wim; Groeseneken, Guido; Henson, Kirklen; Kauerauf, Thomas; Kubicek, Stefan; Lucci, Luca; Lujan, Guilherme; Mentens, Jimmy; Pantisano, Luigi; Petry, Jasmine; Richard, Olivier; Röhr, Erika; Schram, Tom; Vandervorst, Wilfried; Van Doorne, Patrick; Van Elshocht, Sven; Westlinder, Jörgen; Witters, Thomas; Zhao, Chao; Cartier, Eduard; Chen, Jerry; Cosnier, Vincent; Green, Martin; Jang, Se Aug; Kaushik, Vidya; Kerber, Andreas; Kluth, Jon; Lin, Steven; Tsai, Wilman; Young, Edward; Manabe, Yukiko; Shimamoto, Yasuhiro; Bajolet, Philippe; De Witte, Hilde; Maes, Jan; Date, Lucien; Pique, Didier; Coenegrachts, Bart; Vertommen, Johan; Passefort, Sophie (2003)