Browsing by author "Van Look, Lieve"
Now showing items 21-40 of 62
-
Experimental proximity matching of ArF scanners
Bekaert, Joost; Van Look, Lieve; De Bisschop, Peter; Van de Kerkhove, Jeroen; Vandenberghe, Geert; Schreel, K.; Menger, J.; Schiffelers, G.; Knols, E.; van der Laan, H.; Willekers, R. (2008) -
Experimental study of effect of pellicle on optical proximity fingerprint for 1.35 NA immersion ArF lithography
Van Look, Lieve; Bekaert, Joost; Laenens, Bart; Vandenberghe, Geert; Richter, Jan; Bubke, Karsten; Peters, Jan Hendrik; Schreel, Koen; Dusa, Mircea (2010) -
Experimental validation of novel EUV mask technology to reduce mask 3D effects
Van Look, Lieve; Philipsen, Vicky; Hendrickx, Eric; Davydova, Natalia; Wittebrood, Friso; De Kruif, Robert; Van Oosten, Anton; Miyazaki, Junji; Fliervoet, Timon; Van Schoot, Jan; Neumann, Jens Timo (2015) -
Experimental validation of novel mask technology to reduce mask 3D effects
Van Look, Lieve; Philipsen, Vicky; Hendrickx, Eric; Davydova, Natalia; Wittebrood, Friso; De Kruif, Robert; Van Oosten, Anton; Miyazaki, Junji; Fliervoet, Timon; Van Schoot, Jan; Neumann, Jens Timo (2015) -
Experimental verification of phase induced mask 3D effects in EUV imaging
Wittebrood, Friso; de Winter, Laurens; Last, Thorsten; Van Look, Lieve; Philipsen, Vicky; Finders, Jo; Schiffelers, Guido; Hendrickx, Eric (2015) -
Experimental verification of source-mask optimization and freeform illumination for 22 nm node SRAM cells
Bekaert, Joost; Laenens, Bart; Verhaegen, Staf; Van Look, Lieve; Trivkovic, Darko; Lazzarino, Frederic; Vandenberghe, Geert; Van Adrichem, Paul; Socha, Robert; Hsu, Stephen; Liu, Hua Yu; Mouraille, Orion; Schreel, Koen; Dusa, Mircea; Zimmermann, Joerg; Gräupner, Paul; Neumann, Jens Timo (2011-03) -
Extreme scaling of optical lithography: overview of process integration issues
Ronse, Kurt; Wiaux, Vincent; Verhaegen, Staf; Van Look, Lieve; Bekaert, Joost; Laidler, David; Cheng, Shaunee; Maenhoudt, Mireille; Vandenberghe, Geert; Dusa, Mircea (2009) -
Freeform illumination sources: an experimental study of source-mask optimization for 22nm SRAM cells
Bekaert, Joost; Laenens, Bart; Verhaegen, Staf; Van Look, Lieve; Trivkovic, Darko; Lazzarino, Frederic; Vandenberghe, Geert; Van Adrichem, Paul; Socha, Robert; Baron, S.; Tsai, M.-C.; Ning, K.; Hsu, S.; Liu, H.Y.; Mulder, M.; Bouma, A.; van der Heijden, E.; Mouraille, O.; Schreel, K.; Finders, Jo; Dusa, Mircea; Zimmerman, J.; Graeupner, Paul; Neumann, J.T.; Hennerkes, C. (2010) -
Freeform illumination sources: Source mask optimization for 22 nm node SRAM
Bekaert, Joost; Laenens, Bart; Verhaegen, Staf; Van Look, Lieve; Trivkovic, Darko; Lazzarino, Frederic; Vandenberghe, Geert; Van Adrichem, Paul; Socha, Robert; Mulder, M.; Baron, Stanislas; Tsai, Min-Chun; Ning, Kai; Hsu, Stephen; Bouma, A.; van der Heijden, E.; Schreel, Koen; Carpaij, R.; Dusa, Mircea; Zimmerman, Joerg; Graeupner, Paul; Hennerkes, Christoph (2009) -
Guided vortex motion in superconductors with a square antidot array
Silhanek, A.V.; Van Look, Lieve; Raedts, S.; Jonckheere, Rik; Moshchalkov, V.V. (2003-12) -
High throughput grating qualification of directed self-assembly patterns using optical metrology
Van Look, Lieve; Rincon Delgadillo, Paulina; Lee, Yu-tsung; Pollentier, Ivan; Gronheid, Roel; Cao, Yi; Lin, Guanyang; Nealey, Paul F. (2013) -
High throughput grating qualification of directed self-assembly patterns using optical metrology
Van Look, Lieve; Rincon Delgadillo, Paulina; Lee, Yu-tsung; Pollentier, Ivan; Gronheid, Roel; Cao, Yi; Lin, Guanyang; Nealey, Paul F. (2014) -
High-speed full 3D feature metrology for litho monitoring, matching and model calibration with scatterometry
Cramer, H.; Chen, An; Li, Frank; Leray, Philippe; Charley, Anne-Laure; Van Look, Lieve; Bekaert, Joost; Cheng, Shaunee (2012) -
Hyper-NA imaging using two-beam interference
Hendrickx, Eric; Van Look, Lieve; Versluijs, Janko; Ronse, Kurt (2005) -
Image contrast metrology for EUV lithography
Brunner, Timothy A.; Truffert, Vincent; Ausschnitt, Kit; Kissoon, Nicola N.; Duriau, Edouard; Jonckers, Tom; van Look, Lieve; Franke, Joern-Holger (2022-09-29) -
Image imbalance compensation in alternating phase-shift masks towards the 45 node through-pitch imaging
Van Look, Lieve; Kasprowicz, Bryan; Zibold, Axel; Degel, Wolfgang; Vandenberghe, Geert (2005) -
Imaging validation for LS of dark field low-n vs Ta-based absorber masks
Kovalevich, Tatiana; Van Look, Lieve; Moussa, Alain; Franke, Joern-Holger; Philipsen, Vicky (2023) -
Impact of mask corner rounding on pitch 40 nm contact hole variability
van Look, Lieve; Gillijns, Werner; Gallagher, Emily (2021) -
Improving exposure latitude and aligning best focus through pitch by curing M3D effects with controlled aberrations
Franke, Joern-Holger; Bekaert, Joost; Blanco, Victor; Van Look, Lieve; Wahlisch, Felix; Lyakhova, Kateryna; Van Adrichem, Paul; Maslow, Mark John; Schiffelers, Guido; Hendrickx, Eric (2019) -
In-plane anisotropic vortex motion induced by a square array of antidots
Silhanek, A.V.; Van Look, Lieve; Raedts, S.; Jonckheere, Rik; Moshchalkov, V.V. (2004)